Encapsulation of Au nanoparticles on a silicon wafer during thermal oxidation

Journal of Physical Chemistry C

Volumn 117, Issue 41, 2013, Pages 21577-21582

  Bowker, M ^a,b   Crouch, J J ^a,c   Carley, A F ^a   Davies, P R ^a   Morgan, D J ^a   Lalev, G ^a   Dimov, S ^a,d   Pham, D T ^a,d  

^a CARDIFF UNIVERSITY   (United Kingdom)

^b RUTHERFORD APPLETON LABORATORY   (United Kingdom)

^c Queen's Buildings ^*  (United Kingdom)

^d UNIVERSITY OF BIRMINGHAM   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

GAS ADSORPTION; GOLD; NANOPARTICLES; OXYGEN; SILICA; SILICON OXIDES; SILICON WAFERS; SIO2 NANOPARTICLES; SUBSTRATES; THERMOOXIDATION;

COMBINED STRUCTURE; HIGH TEMPERATURE; METAL SEMICONDUCTORS; OXYGEN ADSORPTION; OXYGEN DIFFUSION; SI(111) SUBSTRATE; SILICON SUBSTRATES; THERMAL OXIDATION;

GOLD NANOPARTICLES;

EID: 84886068428     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp4074043     Document Type: Article

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