Plasma Deposition of N-TiO2 Thin Films

Industrial Plasma Technology: Applications from Environmental to Energy Technologies

Volumn , Issue , 2010, Pages 349-356

  Romero Ǵomez, Pablo ^a   Barranco, Angel ^a   Cotrino, Jośe ^a   Espińos, Juan P ^a   Yubero, Francisco ^a   Gonźalez Elipe, Agust́in R ^a  

^a INSTITUTO DE CIENCIA DE MATERIALES DE SEVILLA   (Spain)

Author keywords

Optical emission spectroscopy; Orbital motionlimited theory; Phenomenology; Plasma enhanced chemical vapor deposition; Titanium tetra isopropoxide

Indexed keywords

EID: 84886014967     PISSN: None     EISSN: None     Source Type: Book    
DOI: 10.1002/9783527629749.ch28     Document Type: Chapter

References (24)

1. Hueso, J.L., Espińos, J.P., Caballero, A., Cotrino, J., and Gonźalez-Elipe, A.R. (2007) Carbon, 45, 89.
2. Suraj, K.S., Bharathi, P., Prahlad, V., and Mukherjee, S. (2007) Surf. Coat. Technol., 202, 301.
3. Gordiets, B., Ferreira, C.M., Pinheiro, M.J., and Ricard, A. (1998) Plasma Sources Sci. Technol., 7, 363.
4. Asahi, R., Morikawa, T., Ohwaki, T., Aoki, K., and Taga, Y. (2001) Science, 293, 269.
5. Sakthivel, S., Janczarek, M., and Kirsch, H. (2004) J. Phys. Chem. B, 108, 19384.
6. Yates, H.M., Nolan, M.G., Sheel, D.W., and Pemble, M.E. (2006) J. Photochem. Photobiol. A: Chem., 179, 223.
7. Livraghi, S., Paganini, M.C., Giamello, E., Selloni, A., Valentin, C.D., and Pacchioni, G. (2006) J. Am. Chem. Soc., 128, 15666.
8. Lee, J.-Y., Park, J., and Cho, J.-H. (2005) Appl. Phys. Lett., 87, 011904.
9. Wong, M.-S., Chou, H.P., and Yang, T.-S. (2005) Thin Solid Film, 494, 244.
10. Maeda, M. and Watanabe, T. (2006) J. Electrochem. Soc., 153, C186.
11. Borŕas, A., Cotrino, J., and Gonźalez-Elipe, A.R. (2007) J. Electrochem. Soc., 154, 152.
12. Gracia, F., Holgado, J.P., and Gonźalez-Elipe, A.R. (2004) Langmuir, 20, 1688.
13. Cotrino, J., Palmero, A., and Rico, V. (2001) J. Vac. Sci. Technol. B, 19, 1071.
14. Brockhaus, A., Borchardt, A., and Engeman, J. (1994) Plasma Sources Sci. Technol., 3, 539.
15. Van Helden, J.H., Van Den Oever, P.J., Kessels, W.M.M., Van De Sanden, M.C.M., Schram, D.C., and Engeln, R. (2007) J. Phys. Chem. A, 111, 11460-11472.
16. Jauberteau, J.L. and Jauberteau, I. (2008) Plasma Sources Sci. Technol., 17, 015019.
17. Loureiro, J. and Ricard, A. (1993) J. Phys. D: Appl. Phys., 26, 163.
18. Pearse, R.W.B. and Gaydon, A.G. (1963) The Identification of Molecular Spectra, John Wiley & Sons, Inc., New York
19. Wiese, W.L., Smith, M.W., and Glennon, B.M. (1966) Atomic Transition Probabilities, National Bureau of Standards, Gaithersburg.
20. Boudam, M.K., Saoudi, B., Moisan, M., and Ricard, A. (2007) J. Phys. D: Appl. Phys., 40, 1694.
21. Dood, J.A., Lipson, S.J., Flanagan, D.J., Blumberg, W.A.M., Person, J.C., and Green, B.O. (1991) J. Chem. Phys., 94, 4301.
22. Qiu, X., Zhao, Y., and Burda, C. (2007) Adv. Mater., 19, 3995.
23. Asahi, R., Morikawa, T., Hazama, H., and Matsubara, M. (2008) J. Phys.: Condens. Matter, 20, 064227.
24. Cong, Y., Zhang, J., Chen, F., and Anpo, M. (2007) J. Phys. Chem. C, 111, 6976.