Vapour phase epitaxy of Cu2O on a-plane Al2O3

Physica Status Solidi (C) Current Topics in Solid State Physics

Volumn 10, Issue 10, 2013, Pages 1284-1287

  Wagner, Alexander ^a   Scherg Kurmes, Harald ^a   Waag, Andreas ^a   Bakin, Andrey ^a  

^a TECHNICAL UNIVERSITY OF BRAUNSCHWEIG   (Germany)

Author keywords

A Al2O3; Cu2O; VPE

Indexed keywords

A-AL2O3; GROWTH PARAMETERS; HIGH RESOLUTION X RAY DIFFRACTION; IMPURITY INCORPORATION; INFLUENCE OF PROCESS PARAMETERS; PRECURSOR MATERIALS; TEMPERATURE RANGE; VAPOUR PHASE EPITAXY;

ALUMINUM; COPPER; EPITAXIAL GROWTH; VAPOR PHASE EPITAXY; X RAY DIFFRACTION;

VAPORS;

EID: 84885840280     PISSN: 18626351     EISSN: 16101642     Source Type: Journal    
DOI: 10.1002/pssc.201200951     Document Type: Article

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