Atomic oxygen TALIF measurements in an atmospheric-pressure microwave plasma jet with in situ xenon calibration

Plasma Science and Technology

Volumn 22, Issue 5, 2013, Pages

  Van Gessel, A F H ^a   Van Grootel, S C ^a   Bruggeman, P J ^a  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ABSOLUTE DENSITY; LASER INDUCED FLUORESCENCE; MICROWAVE PLASMA JET; OXIDIZED COMPONENTS; RAMAN SCATTERING MEASUREMENTS; SPATIALLY RESOLVED; THOMSON SCATTERING; TWO-PHOTON ABSORPTIONS;

ATMOSPHERIC PRESSURE; CALIBRATION; MIXTURES; OXYGEN; RAMAN SCATTERING; TWO PHOTON PROCESSES;

XENON;

EID: 84885401357     PISSN: 10090630     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/22/5/055010     Document Type: Article

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