Influence of O2 - Plasma ambience and growth temperature on the oxidation of Mo-metal and volatilization of oxides

AIP Advances

Volumn 3, Issue 9, 2013, Pages

  Sharma, Rabindar K ^a   Reddy, G B ^a  

^a INDIAN INSTITUTE OF TECHNOLOGY DELHI   (India)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC DISCHARGES; METALS; MOLYBDENUM METALLOGRAPHY; MORPHOLOGY; OXIDATION; OXIDE FILMS; OXYGEN; SCANNING ELECTRON MICROSCOPY; SILICON; STRIP METAL; SUBSTRATES; SURFACE MORPHOLOGY; TEMPERATURE; THIN FILMS; X RAY DIFFRACTION;

FILM FORMATIONS; LOW TEMPERATURES; OXYGEN PLASMAS; SI SUBSTRATES; SILICON SUBSTRATES; STRIP SURFACE; STRIP TEMPERATURE; VAPOR SOURCES;

MOLYBDENUM OXIDE;

EID: 84885399754     PISSN: None     EISSN: 21583226     Source Type: Journal    
DOI: 10.1063/1.4821284     Document Type: Article

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