The structural and surface properties of carbon nanotube synthesized by microwave plasma chemical vapor deposition method for superhydrophobic coating

Thin Solid Films

Volumn 546, Issue , 2013, Pages 94-97

  Lee, Jae Hyeong ^a   Lee, Su Ho ^a   Kim, Doyoung ^b   Park, Yong Seob ^c  

^a Sungkyunkwan University   (South Korea)

^b Ulsan College   (South Korea)

^c Chosun College of Science and Technology   (South Korea)

Author keywords

(MPCVD); Carbon nanotube (CNT); Contact angle; Hydrophobic; Microwave plasma chemical vapor deposition; Working pressure

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CONTACT ANGLE; DEPOSITION; DIAMOND FILMS; HYDROPHOBICITY; MAGNETRON SPUTTERING; MICROWAVES; MULTIWALLED CARBON NANOTUBES (MWCN); NANOTUBES; NICKEL; PLASMA CVD; SURFACE CHEMISTRY; TEMPERATURE; VAPOR DEPOSITION; YARN;

(MPCVD); HYDROPHOBIC; MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITIONS; RF MAGNETRON SPUTTERING METHOD; SUPER-HYDROPHOBIC SURFACES; SUPERHYDROPHOBIC COATINGS; SURFACE CHARACTERISTICS; WORKING PRESSURES;

CARBON NANOTUBES;

EID: 84885326844     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2013.05.018     Document Type: Conference Paper

References (16)

1. S. Ijima, Nature 354 (1991) 56.
2. H. Dai, J.H. Hafner, A.G. Rinzler, D.T. Rinzler, D.T. Colbert, R.E. Smalley, Nature 384 (1996) 147.
3. F. Ito, K. Konuma, A. Okamoto, J. Appl. Phys. 89 (2001) 8141.
4. A.C. Dillon, K.M. Jones, T.A. Bekkedahl, C.H. Kiang, D.S. Bethune, M.J. Heben, Nature 386 (1997) 377.
5. P.G. Collins, A. Zettle, H. Bando, A. Thess, R.E. Smally, Science 278 (1997) 100.
6. G. Che, B.B. Lakshmi, E.R. Fisher, C.R. Martin, Nature 393 (1998) 346.
7. Q. Zhao, J.R. Wood, H.D. Wagner, Appl. Phys. Lett. 78 (2001) 1748.
8. J.M. Mao, L.F. Sun, L.X. Qian, Z.W. Pan, B.H. Chang, W.Y. Zhou, G. Wang, S.S. Xie, Appl. Phys. Lett. 72 (1998) 3297.
9. Y.C. Choi, D.J. Bae, Y.H. Lee, B.S. Lee, I.T. Han, W.B. Choi, N.S. Lee, J.M. Kim, Synth. Metals 108 (2000) 159.
10. Th. Dikonimos Makris, R. Giorgi, N. Lisi, L. Pilloni, E. Salernitano, F. Sarto, M. Alvisi, Diam. Relat. Mater. 13 (2004) 305.
11. D.L. Smith, Thin-Film Deposition Principles and Practice, International edition McGraw-Hill, Taipei, 1999. p. 508.
12. Th. Dikonimos Makris, L. Giorgi, R. Giorgi, N. Lisi, E. Salernitano, Diam. Relat. Mater. 14 (2005) 815.
13. Y. Saito, M. Okuda, N. Fujmoto, Jpn. J. Appl. Phys. 33 (1994) L526.
14. W.Z. Li, J.G. Wen, Y. Tu, Z.F. Ren, Appl. Phys. A 73 (2001) 259.
15. C.H. Lin, S.H. Lee, C.M. Hsu, C.T. Kuo, Diam. Relat. Mater. 13 (2004) 2147.
16. C.F. Chen, C.L. Tsai, C.L. Lin, Diam. Relat. Mater. 12 (2003) 1500.