Thickness dependence of microstructure and properties of ZnO thin films deposited by metal-organic chemical vapor deposition using ultrasonic nebulization

Thin Solid Films

Volumn 546, Issue , 2013, Pages 38-41

  Lee, Choon Ho ^a   Kim, Do Woo ^a  

^a Keimyung University   (South Korea)

Author keywords

MOCVD; Thin films; ZnO

Indexed keywords

CRYSTAL STRUCTURE; DEPOSITION; DEPOSITION RATES; ENERGY GAP; FILM THICKNESS; INDUSTRIAL CHEMICALS; MASS TRANSFER; METALLIC FILMS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MICROSTRUCTURE; OPTICAL FILMS; ORGANIC CHEMICALS; ORGANOMETALLICS; REACTION RATES; SUBSTRATES; SURFACE REACTIONS; VAPOR DEPOSITION; ZINC OXIDE;

COLUMNAR STRUCTURES; CONTROLLED CONDITIONS; MICROSTRUCTURE AND PROPERTIES; MICROSTRUCTURES AND PROPERTIES; PROCESS CONTROLLING; SODA LIME GLASS SUBSTRATE; THICKNESS DEPENDENCE; ULTRASONIC NEBULIZATION;

THIN FILMS;

EID: 84885316693     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2013.05.029     Document Type: Conference Paper

References (10)

1. G.S. Kino, R.S. Wagers, J. Appl. Phys. 44 (1973) 1480.
2. H. Kim, J.S. Horowitz, S.B. Quadri, D.B. Chrisey, Thin Solid Films 420 (2002) 107.
3. R.L. Hoffman, B.J. Norris, J.F. Wager, Appl. Phys. Lett. 82 (2005) 733.
4. T. Minami, H. Sato, H. Sonohara, S. Takata, T. Miyata, I. Fukuda, Thin Solid Films 253 (1994) 14.
5. J.T. Cheung, S.R. Johnson, Aerospace Eng. 14 (1994) 7.
6. H. Gomez, A. Maldonado, R. Asomoza, E.P. Zironi, J. Caneta-Ortega, J. Palacios Gomez, Thin Solid Films 293 (1997) 117.
7. H. Jin, B. Xu, C.B. Park, Trans. Electr. Electron. Mater. 12 (2011) 169.
8. J.E. Kim, S.M. Bae, H. Yang, J.H. Hwang, J. Korean Ceram. Soc. 47 (2010) 353.
9. S.M. Park, T. Ikegami, K. Ebihara, Thin Solid Films 513 (2006) 90.
10. C.H. Lee, D.W. Kim, J. Ceram. Process. Res. 13 (2012) s377.