Plasma synthesis of silicon nanoparticles: Optimization of yield, size distribution, and crystallinity

Nihon Kikai Gakkai Ronbunshu, B Hen/Transactions of the Japan Society of Mechanical Engineers, Part B

Volumn 79, Issue 804, 2013, Pages 1616-1623

  Yamda, Riku ^a   Gresback, Ryan ^a   Yi, Ding ^a   Okazaki, Ken ^a   Nozaki, Tomohiro ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Chemical reaction; Nanotechnology; Plasma; Silicon ink; Silicon nanoparticle

Indexed keywords

AMORPHOUS SILICON FILM; FORMATION MECHANISM; OPERATION REGIME; OPTICAL AND ELECTRONIC PROPERTIES; PARTICLE NUCLEATION; SILICON NANOPARTICLES; SILICON TETRACHLORIDE; SPECIFIC ENERGY INPUT;

CHEMICAL REACTIONS; ELECTRONIC PROPERTIES; FLOW RATE; IONIC LIQUIDS; NANOPARTICLES; NANOTECHNOLOGY; PLASMA CVD; PLASMAS; RESIDENCE TIME DISTRIBUTION; SIZE DISTRIBUTION;

SILICON;

EID: 84885154106     PISSN: 03875016     EISSN: None     Source Type: Journal    
DOI: 10.1299/kikaib.79.1616     Document Type: Article

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