Advancements in displacement metrology based on encoder systems

Proceedings of the 23rd Annual Meeting of the American Society for Precision Engineering, ASPE 2008 and the 12th ICPE

Volumn , Issue , 2008, Pages

  Holzapfel, Wolfgang ^a  

^a Dr Johannes Heidenhain GmbH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CRITICAL MEASUREMENTS; ENVIRONMENTAL CONDITIONS; GRATING INTERFEROMETERS; MANUFACTURING EQUIPMENT; OPTICAL PATH LENGTHS; PRODUCTION EQUIPMENTS; SHORT TIME INTERVALS; SUBNANOMETER RESOLUTION;

CALIBRATION; EQUIPMENT; ERRORS; FEEDBACK; INTERPOLATION; LASER INTERFEROMETRY; PRECISION ENGINEERING;

INTERFEROMETERS;

EID: 84884962250     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (6)

1. H. Kunzmann, T. Pfeifer, J. Flügge, Scales vs Laserinterferometers - Performance and comparision of two measuring systems, Annals CIRP 42 (2) 1993, p 753-767
2. A. Spies, Längen in der Ultrapräzisionstechnik messen, Feinwerktechnik & Messtechnik 98, Vol. 10, 1990, p 404-410
3. J. Thiel, E. Spanner, Interferential linear encoder with 270mm measuring length for nanometrology, http://www.auto-met.com/heidenhain/techdata/thiel.html
4. G. X. Zhang, A study on the Abbe principle and Abbe error, Annals CIRP 38 (1) 1989, p 525-528
5. th euspen International Conference, Baden 2006
6. J. Flügge, R. Köning, Status of the nanometer comparator at the PTB, In J.E. Decker, N. Brown, editors, Proceedings of SPIE Vol. 4401, 2001, p 275-283