Sub-100 nm pattern formation by roll-to-roll nanoimprint

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 8323, Issue , 2012, Pages

  Inanami, Ryoichi ^a   Ojima, Tomoko ^a   Matsuki, Kazuto ^a   Kono, Takuya ^a   Nakasugi, Tetsuro ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

film mold; nanoimprint lithography; nickel mold; printed electronics; roll to roll

Indexed keywords

MOLDS;

FLEXIBLE SUBSTRATE; LARGE AREA DEVICES; LOW COST FABRICATION; PATTERN FABRICATION; PATTERNING TECHNIQUES; PRINTED ELECTRONICS; ROLL TO ROLL; ULTRAVIOLET CURABLE;

NANOIMPRINT LITHOGRAPHY;

EID: 84884938907     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.916584     Document Type: Conference Paper

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