Surface modification of thin film composite polyamide membrane using atomic layer deposition method

Journal of Membrane Science

Volumn 450, Issue , 2014, Pages 174-180

  Nikkola, Juha ^a   Sievänen, Jenni ^a   Raulio, Mari ^a   Wei, Jing ^b   Vuorinen, Jyrki ^c   Tang, Chuyang Y ^b  

^a VTT TECHNICAL RESEARCH CENTRE OF FINLAND   (Finland)

^b NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^c TAMPERE UNIVERSITY OF TECHNOLOGY   (Finland)

Author keywords

Aluminium oxide (Al2O3); Atomic layer deposition (ALD); Inorganic surface modification; Reverse osmosis membrane; Thin film composite (TFC) polyamide (PA)

Indexed keywords

ALUMINIUM OXIDE; BACTERIA ATTACHMENTS; POLYAMIDE MEMBRANES; PROCESS PARAMETERS; PROCESSING PARAMETERS; PROCESSING TEMPERATURE; PSEUDOMONAS AERUGINOSA; THIN FILM COMPOSITES;

ALUMINUM COATINGS; BACTERIA; COATINGS; DEPOSITION; HYDROPHILICITY; MEMBRANES; REVERSE OSMOSIS; SURFACE ROUGHNESS;

ATOMIC LAYER DEPOSITION;

POLYAMIDE;

ARTICLE; ARTIFICIAL MEMBRANE; ATOMIC LAYER DEPOSITION METHOD; BACTERIAL CELL; CHEMICAL PROCEDURES; COMPOSITE MATERIAL; FILM; HYDROPHILICITY; NONHUMAN; PERMEABILITY; PRIORITY JOURNAL; PSEUDOMONAS AERUGINOSA; REVERSE OSMOSIS; SURFACE PROPERTY; TEMPERATURE;

EID: 84884713169     PISSN: 03767388     EISSN: 18733123     Source Type: Journal    
DOI: 10.1016/j.memsci.2013.09.005     Document Type: Article

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