Influence of Cu substrate topography on the growth morphology of chemical vapour deposited graphene

Carbon

Volumn 65, Issue , 2013, Pages 7-12

  Xiao, Ye ^a   Kim, Hokwon ^a   Mattevi, Cecilia ^a   Chhowalla, Manish ^b   Maher, Robert C ^b   Cohen, Lesley F ^a  

^a IMPERIAL COLLEGE LONDON   (United Kingdom)

^b Piscataway   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOUR DEPOSITION; CHEMICAL VAPOURS; DOMINATING FACTORS; GROWTH MORPHOLOGY; PERIODIC PATTERN; RAMAN SPECTROSCOPIC; STRONG CORRELATION; SUBSTRATE TOPOGRAPHY;

CHEMICAL VAPOR DEPOSITION; COPPER; FILM GROWTH; GRAPHENE; METAL CLADDING; SUBSTRATES; VAPORS;

TOPOGRAPHY;

EID: 84884532865     PISSN: 00086223     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.carbon.2013.06.090     Document Type: Article

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