Control of calcium phosphate thin film stoichiometry using multi-target sputter deposition

Surface and Coatings Technology

Volumn 233, Issue , 2013, Pages 131-139

  Boyd, A R ^a   O'Kane, C ^a   Meenan, B J ^a  

^a UNIVERSITY OF ULSTER   (United Kingdom)

Author keywords

Di calcium phosphate; Hydroxyapatite; RF magnetron sputtering; Stoichiometry; Thin film; Tri calcium phosphate

Indexed keywords

AS-DEPOSITED STATE; DEPOSITION TECHNIQUE; FILM STOICHIOMETRY; PREFERRED ORIENTATIONS; PROCESSING CONDITION; RF-MAGNETRON SPUTTERING; TARGET COMPOSITION; TRI-CALCIUM PHOSPHATES;

CALCIUM PHOSPHATE; DEPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDROXYAPATITE; MAGNETRON SPUTTERING; PHOTOELECTRONS; STOICHIOMETRY; THIN FILMS; TRANSMISSION CONTROL PROTOCOL; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

COATINGS;

EID: 84884414920     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2013.04.017     Document Type: Article

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