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Volumn 203, Issue 1-2, 2008, Pages 121-128

The influence of target stoichiometry on the surface properties of sputter deposited calcium phosphate thin films

Author keywords

Calcium phosphate; RF magnetron sputtering; Stoichiometry; Thin film; X ray Photoelectron Spectroscopy

Indexed keywords

AMORPHOUS MATERIALS; CALCIUM; COATINGS; DEPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MAGNETRON SPUTTERING; PHASE COMPOSITION; PHOSPHATE COATINGS; PHOTOELECTRONS; PHOTONS; STOICHIOMETRY; THIN FILMS; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 77649192420     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2008.08.007     Document Type: Article
Times cited : (24)

References (28)
  • 18
    • 0003708256 scopus 로고
    • J.F. Moulder, W.F. Stickle, P.E. Sobol, K.D. Bomben Eds, Physical Electronics Inc, Minnesota, USA
    • J.F. Moulder, W.F. Stickle, P.E. Sobol, K.D. Bomben (Eds.), Handbook of X-ray Photoelectron Spectroscopy, Physical Electronics Inc., Minnesota, USA, 1995.
    • (1995) Handbook of X-ray Photoelectron Spectroscopy


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.