Study of the influence of oxygen on the composition of thin films obtained by r.f. Sputtering from a Ca5(PO4)3OH target

Thin Solid Films

Volumn 304, Issue 1-2, 1997, Pages 191-195

  Van Dijk, K ^a   Verhoeven, J ^b   Maree C H M ^c   Habraken, F H P M ^c   Jansen, J A ^a  

^a RADBOUD UNIVERSITY MEDICAL CENTER   (Netherlands)

^b FOM INSTITUTE AMOLF   (Netherlands)

^c UTRECHT UNIVERSITY   (Netherlands)

Author keywords

Ceramics; Deposition process; Oxygen; Sputtering

Indexed keywords

COMPOSITION EFFECTS; FILM GROWTH; FOURIER TRANSFORM INFRARED SPECTROSCOPY; OXYGEN; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SPUTTER DEPOSITION; STOICHIOMETRY; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

RADIOFREQUENCY SPUTTERING;

CERAMIC MATERIALS;

EID: 0031187494     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00104-1     Document Type: Article

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