SCOPUS 정보 검색 플랫폼

Volumn 232, Issue , 2013, Pages 535-540

Sputter deposition of hard quaternary Al-Mg-B-Ti nanocomposite films

(9) Yan, C a Qian, J C a Ng, T W a Zhou, Z F a Li, K Y a Zhang, W J a Bello, I a Martinu, L b Klemberg Sapieha, J E b

a CITY UNIVERSITY OF HONG KONG (Hong Kong)

b ÉCOLE POLYTECHNIQUE DE MONTRÉAL (Canada)

Author keywords

Corrosion resistance; Hard and superhard coatings; Mechanical properties; Nanocomposite structure; Quaternary Al Mg B Ti coatings; Sputter deposition

Indexed keywords

LIGHTWEIGHT MATERIALS; MAGNETIC FIELD CONFIGURATIONS; MAXIMUM HARDNESS; NANO-COMPOSITE STRUCTURE; PLANAR MAGNETRON; SATURATED VAPOR; STRUCTURAL MODELING; SUPERHARD COATINGS;

ALUMINUM COATINGS; CORROSION RESISTANCE; DEPOSITION; ELASTIC MODULI; FILMS; HARD COATINGS; MECHANICAL PROPERTIES; SEMICONDUCTOR DOPING; SPUTTER DEPOSITION; TITANIUM;

ALUMINUM;

EID: 84883446218 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/j.surfcoat.2013.06.025 Document Type: Article

Times cited : (16)

References (13)

1
- 0001357013
- Zhdanov G.S., Sevastyanov N.G. Dokl. Akad. Nauk SSSR 1941, 32:832.
- (1941) Dokl. Akad. Nauk SSSR , vol.32 , pp. 832
- Zhdanov, G.S.¹ Sevastyanov, N.G.²

2
- 0001760823
- Matkovitch V.I., Economy J. J. Acta Crystallogr. 1970, B26:616.
- (1970) J. Acta Crystallogr. , vol.B26 , pp. 616
- Matkovitch, V.I.¹ Economy, J.²

3
- 0020806179
- Higashi I., Ito T. J. Less-Common Met. 1983, 92:239.
- (1983) J. Less-Common Met. , vol.92 , pp. 239
- Higashi, I.¹ Ito, T.²

4
- 0033877909
- Cook B.A., Harringa J.L., Lewis T.L., Russell A.M. Scripta Mater. 2000, 42:597.
- (2000) Scripta Mater. , vol.42 , pp. 597
- Cook, B.A.¹ Harringa, J.L.² Lewis, T.L.³ Russell, A.M.⁴

5
- 0037052740
- Russell A.M., Cook B.A., Harringa J.L., Lewis T.L. Scripta Mater. 2002, 46:629.
- (2002) Scripta Mater. , vol.46 , pp. 629
- Russell, A.M.¹ Cook, B.A.² Harringa, J.L.³ Lewis, T.L.⁴

6
- 0001471566
- Schmechel R., Werheit H. J. Phys. Condens. Matter 1999, 11:6803.
- (1999) J. Phys. Condens. Matter , vol.11 , pp. 6803
- Schmechel, R.¹ Werheit, H.²

7
- 0027833267
- Werheit H., Kuhlmann U., Krach G., Higashi I., Lundstro T., Yu Y. J. Alloys Compd. 1993, 202:269.
- (1993) J. Alloys Compd. , vol.202 , pp. 269
- Werheit, H.¹ Kuhlmann, U.² Krach, G.³ Higashi, I.⁴ Lundstro, T.⁵ Yu, Y.⁶

8
- 0142229570
- Tian Y., Bastawros A.F., Lo C.C.H., Constant A.P., Russell A.M., Cook B.A. Appl. Phys. Lett. 2003, 83:2781.
- (2003) Appl. Phys. Lett. , vol.83 , pp. 2781
- Tian, Y.¹ Bastawros, A.F.² Lo, C.C.H.³ Constant, A.P.⁴ Russell, A.M.⁵ Cook, B.A.⁶

9
- 4444331447
- Tian Y., Li G., Shinar J., Wang N.L., Cook B.A., Anderegg J.W., Constant A.P., Russell A.M., Snyder J.E. Appl. Phys. Lett. 2004, 85:1181.
- (2004) Appl. Phys. Lett. , vol.85 , pp. 1181
- Tian, Y.¹ Li, G.² Shinar, J.³ Wang, N.L.⁴ Cook, B.A.⁵ Anderegg, J.W.⁶ Constant, A.P.⁷ Russell, A.M.⁸ Snyder, J.E.⁹

10
- 0037109131
- Tian Y., Womack M., Molian P., Lo C.C.H., Anderegg J.W., Russell A.M. Thin Solid Films 2002, 418:129.
- (2002) Thin Solid Films , vol.418 , pp. 129
- Tian, Y.¹ Womack, M.² Molian, P.³ Lo, C.C.H.⁴ Anderegg, J.W.⁵ Russell, A.M.⁶

11
- 77955658814
- Yan C., Zhou Z.F., Chong Y.M., Liu C.P., Liu Z.T., Liu Z.T., Li K.Y., Bello I., Kutsay O., Zapien J.A., Zhang W.J. Thin Solid Films 2010, 518:5372.
- (2010) Thin Solid Films , vol.518 , pp. 5372
- Yan, C.¹ Zhou, Z.F.² Chong, Y.M.³ Liu, C.P.⁴ Liu, Z.T.⁵ Liu, Z.T.⁶ Li, K.Y.⁷ Bello, I.⁸ Kutsay, O.⁹ Zapien, J.A.¹⁰ Zhang, W.J.¹¹

12
- 0024302207
- Brusic V., Russak M., Schad R., Frankel G., Selius A., DiMilia D. J. Electrochem. Soc. 1989, 136:42.
- (1989) J. Electrochem. Soc. , vol.136 , pp. 42
- Brusic, V.¹ Russak, M.² Schad, R.³ Frankel, G.⁴ Selius, A.⁵ DiMilia, D.⁶

13
- 75149138314
- Wang C.C., Chia R.W.J., Lee J.K., Tang W.T. J. Vac. Sci. Technol. 1998, A16:1745.
- (1998) J. Vac. Sci. Technol. , vol.A16 , pp. 1745
- Wang, C.C.¹ Chia, R.W.J.² Lee, J.K.³ Tang, W.T.⁴

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.