Synthesis and characterization of hard ternary AlMgB composite films prepared by sputter deposition

Thin Solid Films

Volumn 518, Issue 19, 2010, Pages 5372-5377

  Yan, Ce ^a   Zhou, Z F ^a   Chong, Y M ^a   Liu, C P ^a   Liu, Z T ^a   Li, K Y ^a   Bello, I ^a   Kutsay, O ^a   Zapien, J A ^a   Zhang, W J ^a  

^a CITY UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

Hard coatings; Magnetron sputtering; Mechanical properties; Spectroscopy; Structural properties; Thin films

Indexed keywords

ALUMINUM-MAGNESIUM; ATOMIC RATIO; FILM COMPOSITION; FILM MORPHOLOGY; HYDROGENATED DIAMOND; PLANAR MAGNETRON; POWER DENSITIES; ROOT MEAN SQUARE ROUGHNESS; SYNTHESIS AND CHARACTERIZATIONS; THIN FILMS LAMINATED;

ARGON; BORIDES; BORON; BORON CARBIDE; CHEMICAL ANALYSIS; COMPOSITE FILMS; DIAMOND LIKE CARBON FILMS; FILM PREPARATION; HARD COATINGS; HARDNESS; MAGNESIUM; MECHANICAL PROPERTIES; MILITARY APPLICATIONS; OXYGEN; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SPACE APPLICATIONS; STRATEGIC MATERIALS; THIN FILMS; TRACE ELEMENTS; VAPOR DEPOSITION;

CARBON FILMS;

EID: 77955658814     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.03.038     Document Type: Article

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