Effect of annealing on microstructure and dielectric properties of Zn2Ti3O8 thin films by reactive co-sputtering

Surface and Coatings Technology

Volumn 231, Issue , 2013, Pages 153-156

  Huang, Yen Lin ^a   Tsai, Du Cheng ^a   Lee, Ying Chieh ^b   Jung, De Ru ^a   Shieu, Fuh Sheng ^a  

^a NATIONAL CHUNG HSING UNIVERSITY   (Taiwan)

^b NATIONAL PINGTUNG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

Author keywords

Dielectric properties; Reactive Co sputtering; Zinc titanate; Zn2Ti3O8

Indexed keywords

ANNEALING TEMPERATURES; EFFECT OF ANNEALING; LARGE-GRAIN; REACTIVE CO-SPUTTERING; REACTIVE MAGNETRON CO-SPUTTERING; RUTILE TIO; TITANIUM METALS; ZINC TITANATE;

AMORPHOUS FILMS; ANNEALING; DIELECTRIC PROPERTIES; MAGNETRONS; MICROSTRUCTURE; OXIDE MINERALS; SCANNING ELECTRON MICROSCOPY; SPUTTER DEPOSITION; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

ZINC;

EID: 84882881747     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2012.01.055     Document Type: Article

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