SCOPUS 정보 검색 플랫폼

Thin Solid Films

Volumn 518, Issue 24, 2010, Pages 7366-7371

Formation and transformation of ZnTiO3 prepared by sputtering process

(4) Lee, Ying Chieh a Huang, Yen Lin b Lee, Wen His c Shieu, Fuh Sheng b

a NATIONAL PINGTUNG UNIVERSITY OF SCIENCE AND TECHNOLOGY (Taiwan)

b NATIONAL CHUNG HSING UNIVERSITY (Taiwan)

c NATIONAL CHENG KUNG UNIVERSITY (Taiwan)

Author keywords

Amorphous; Magnetron sputtering; Post annealing; Thin film; Zinc titanate

Indexed keywords

AMORPHOUS; ANNEALED FILMS; ANNEALING TEMPERATURES; AS-DEPOSITED FILMS; HEXAGONAL PHASE; PHASE TRANSFORMATION; POST ANNEALING; RF-MAGNETRON SPUTTERING; RUTILE TIO; SPUTTERING PROCESS; SUBSTRATE TEMPERATURE; TIO; XRD; ZINC TITANATE;

ANNEALING; FILM PREPARATION; MAGNETRON SPUTTERING; OXIDE MINERALS; THIN FILMS; ZINC;

AMORPHOUS FILMS;

EID: 77956885213 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2010.05.005 Document Type: Conference Paper

Times cited : (35)

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