Moth-eye antireflection coating fabricated by nanoimprint lithography on 1 eV dilute nitride solar cell

Progress in Photovoltaics: Research and Applications

Volumn 21, Issue 5, 2013, Pages 1158-1162

  Tommila, Juha ^a   Aho, Arto ^a   Tukiainen, Antti ^a   Polojärvi, Ville ^a   Salmi, Joel ^a   Niemi, Tapio ^a   Guina, Mircea ^a  

^a TAMPERE UNIVERSITY OF TECHNOLOGY   (Finland)

Author keywords

antireflection coating; dilute nitride solar cell; III V solar cell; moth eye; nanoimprint lithography

Indexed keywords

CELL PERFORMANCE; DILUTE NITRIDES; III-V SOLAR CELLS; INCIDENT ANGLES; MOTH EYE; SOLAR ILLUMINATION; SPECTRAL RANGE; WINDOW LAYER;

ANTIREFLECTION COATINGS; NANOIMPRINT LITHOGRAPHY; SILICON NITRIDE; SOLAR CELLS;

COATINGS;

EID: 84881233511     PISSN: 10627995     EISSN: 1099159X     Source Type: Journal    
DOI: 10.1002/pip.2191     Document Type: Article

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