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Volumn 62, Issue 9, 2013, Pages 1395-1401

Nanoheterogeneous networks by photopolymerization of perfluoropolyethers and acrylic co-monomers

Author keywords

Acrylic monomers; Fluorinated networks; Perfluoropolyether; Surface properties; UV curing

Indexed keywords

ADVANCED APPLICATIONS; BULK AND SURFACE PROPERTIES; CROSS-LINKED NETWORKS; HEXANEDIOL DIACRYLATE; PERFLUOROPOLYETHERS; TRIMETHYLOLPROPANE TRIACRYLATE; TRIPROPYLENEGLYCOL DIACRYLATE; UV-CURING;

EID: 84881086607     PISSN: 09598103     EISSN: 10970126     Source Type: Journal    
DOI: 10.1002/pi.4436     Document Type: Article
Times cited : (25)

References (35)
  • 16
    • 84881102767 scopus 로고    scopus 로고
    • Methods for fabricating micro and nanostrucutures using soft or imprint lithography. Patent WO 2005/101466 A2
    • Denison GM, Desimone JM, Euliss LE, Exner AE, Maynor BW, Rolland JP, et al, Methods for fabricating micro and nanostrucutures using soft or imprint lithography. Patent WO 2005/101466 A2 (2005).
    • (2005)
    • Denison, G.M.1    Desimone, J.M.2    Euliss, L.E.3    Exner, A.E.4    Maynor, B.W.5    Rolland, J.P.6
  • 19
    • 84881101134 scopus 로고    scopus 로고
    • Nanolithography process. Patent WO2010/094661 A1
    • Koo N, Plachetka U and Moormann C, Nanolithography process. Patent WO2010/094661 A1 (2010).
    • (2010)
    • Koo, N.1    Plachetka, U.2    Moormann, C.3
  • 29


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.