Effect of hydrogen radical on decomposition of chlorosilane source gases

Journal of Physics: Conference Series

Volumn 441, Issue 1, 2013, Pages

  Sumiya, Masatomo ^a   Akizuki, Tomohiro ^a,b   Itaka, Kenji ^c   Kubota, Makoto ^a,b   Tsubouchi, Kenta ^d   Ishigaki, Takamasa ^b   Koinuma, Hideomi ^d,e  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^b HOSEI UNIVERSITY   (Japan)

^c HIROSAKI UNIVERSITY   (Japan)

^d UNIVERSITY OF TOKYO   (Japan)

^e Pusan National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

PHYSICS;

CHLOROSILANES; DYNAMICAL CALCULATIONS; EFFECT OF HYDROGEN; HYDROGEN RADICAL; SIEMENS PROCESS; SOURCE GAS; THERMAL PLASMA;

SILICON;

EID: 84881049452     PISSN: 17426588     EISSN: 17426596     Source Type: Conference Proceeding    
DOI: 10.1088/1742-6596/441/1/012003     Document Type: Conference Paper

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