Kinetics of palladium oxidation in the mbar pressure range: Ambient pressure XPS study

Topics in Catalysis

Volumn 56, Issue 11, 2013, Pages 885-895

  Zemlyanov, Dmitry ^a,b   Klötzer, Bernhard ^c   Gabasch, Harald ^c   Smeltz, Andrew ^a   Ribeiro, Fabio H ^a   Zafeiratos, Spiros ^d,e   Teschner, Detre ^d   Schnörch, Peter ^d   Vass, Elaine ^d,f   Hävecker, Michael ^d   Knop Gericke, Axel ^d   Schlögl, Robert ^d  

^a PURDUE UNIVERSITY   (United States)

^b UNIVERSITY OF LIMERICK   (Ireland)

^c UNIVERSITY OF INNSBRUCK   (Austria)

^d FRITZ HABER INSTITUT DER MAX PLANCK GESELLSCHAFT   (Germany)

^e UNIVERSITÉ DE STRASBOURG   (France)

^f JOHNSON MATTHEY CATALYSTS   (United Kingdom)

Author keywords

Ambient pressure XPS; Palladium oxidation; Palladium single crystal

Indexed keywords

AMBIENT PRESSURE XPS; AMBIENT-PRESSURE X-RAY PHOTOELECTRON SPECTROSCOPIES; INDUCTION PERIODS; INITIAL OXIDATION; KINETICALLY CONTROLLED; LOWER TEMPERATURES; OXIDATION KINETICS; PHOTOELECTRON ENERGY;

CATALYSIS; KINETICS; NUCLEATION; PHOTOELECTRONS; PHOTONS; X RAY PHOTOELECTRON SPECTROSCOPY;

OXIDATION;

EID: 84880406779     PISSN: 10225528     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11244-013-0052-z     Document Type: Conference Paper

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