In situ XPS study of Pd(1 1 1) oxidation at elevated pressure, Part 2: Palladium oxidation in the 10-1 mbar range

Surface Science

Volumn 600, Issue 15, 2006, Pages 2980-2989

  Gabasch, Harald ^a   Unterberger, Werner ^a   Hayek, Konrad ^a   Klötzer, Bernhard ^a   Kleimenov, Evgueni ^b   Teschner, Detre ^b   Zafeiratos, Spiros ^b   Hävecker, Michael ^b   Knop Gericke, Axel ^b   Schlögl, Robert ^b   Han, Jinyi ^c   Ribeiro, Fabio H ^c   Aszalos Kiss, Balazs ^d   Curtin, Teresa ^d   Zemlyanov, Dmitry ^c,d  

^a UNIVERSITY OF INNSBRUCK   (Austria)

^b FRITZ HABER INSTITUT DER MAX PLANCK GESELLSCHAFT   (Germany)

^c PURDUE UNIVERSITY   (United States)

^d UNIVERSITY OF LIMERICK   (Ireland)

Author keywords

Chemisorption; High pressure XPS; Low index single crystal surfaces; Oxidation; Oxygen; Palladium; Single crystal surfaces; Surface chemical reaction; X ray photoelectron spectroscopy

Indexed keywords

CHEMISORPTION; OXIDATION; OXYGEN; SINGLE CRYSTALS; SURFACE TREATMENT; X RAY PHOTOELECTRON SPECTROSCOPY;

HIGH-PRESSURE XPS; LOW INDEX SINGLE CRYSTAL SURFACES; SINGLE CRYSTAL SURFACES; SURFACE CHEMICAL REACTION;

PALLADIUM;

EID: 33745976176     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2006.05.029     Document Type: Article

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