Improvement of epitaxial crystalline silicon thin-film solar cells at Fraunhofer ISE

Conference Record of the IEEE Photovoltaic Specialists Conference

Volumn , Issue , 2008, Pages

  Schmich, E ^a   Lindekugel, S ^a   Reber, S ^a  

^a FRAUNHOFER INSTITUTE FOR SOLAR ENERGY SYSTEMS ISE   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

BACK SURFACE FIELDS; CRYSTALLINE SILICONS; EPITAXIAL CRYSTALLINE SILICONS; MULTI-CRYSTALLINE SILICON; PROCESS OPTIMISATION; REMOTE PLASMA HYDROGEN PASSIVATIONS; SILICON THIN-FILM SOLAR CELLS; THIN-FILM TECHNOLOGY;

OPEN CIRCUIT VOLTAGE; OPTIMIZATION; PLASMA ETCHING; SILICON WAFERS; SOLAR CELLS;

EPITAXIAL GROWTH;

EID: 84879713939     PISSN: 01608371     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/PVSC.2008.4922814     Document Type: Conference Paper

References (8)

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