In situ growth of cellular two-dimensional silicon oxide on metal substrates

ACS Nano

Volumn 7, Issue 6, 2013, Pages 5175-5180

  Ben Romdhane, Ferdaous ^a   Björkman, Torbjörn ^b   Rodríguez Manzo, Julio A ^a,c   Cretu, Ovidiu ^a,d   Krasheninnikov, Arkady V ^b,e   Banhart, Florian ^a  

^a UNIVERSITÉ DE STRASBOURG   (France)

^b AALTO UNIVERSITY   (Finland)

^c UNIVERSITY OF PENNSYLVANIA   (United States)

^d NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^e UNIVERSITY OF HELSINKI   (Finland)

Author keywords

electron microscopy; epitaxial growth; silica; two dimensional crystals

Indexed keywords

FIRST-PRINCIPLES CALCULATION; IN-SITU ELECTRON MICROSCOPY; INTERACTION ENERGIES; NUCLEATION AND GROWTH; ORDERED STRUCTURES; SILICON OXIDE LAYERS; TRANSITION METAL SURFACES; TWO-DIMENSIONAL CRYSTALS;

CALCULATIONS; ELECTRON MICROSCOPES; ELECTRON MICROSCOPY; ENERGY DISSIPATION; EPITAXIAL GROWTH; SILICA; SILICON OXIDES; TWO DIMENSIONAL;

GROWTH KINETICS;

EID: 84879646981     PISSN: 19360851     EISSN: 1936086X     Source Type: Journal    
DOI: 10.1021/nn400905k     Document Type: Article

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