Ab initio study of the friction mechanism of fluorographene and graphane

Journal of Physical Chemistry C

Volumn 117, Issue 24, 2013, Pages 12520-12525

  Wang, Lin Feng ^a   Ma, Tian Bao ^a   Hu, Yuan Zhong ^a   Wang, Hui ^a   Shao, Tian Min ^a  

^a TSINGHUA UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC-SCALE FRICTION; DENSITY FUNCTIONAL THEORY CALCULATIONS; DISPERSION CORRECTION; DISPERSION ENERGIES; FRICTION REDUCTION; INTERLAYER INTERACTIONS; INTERLAYER SPACINGS; REPULSIVE ELECTROSTATIC FORCE;

ATOMS; CHEMICAL BONDS; DESIGN FOR TESTABILITY; ELECTRONEGATIVITY; FRICTION; GRAPHENE; LOADING; TRIBOLOGY; VAN DER WAALS FORCES;

DISPERSIONS;

EID: 84879441195     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp401097a     Document Type: Article

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