Study of TiO2 thin films on Si substrate by the photoacoustic elastic bending method

Science China: Physics, Mechanics and Astronomy

Volumn 56, Issue 7, 2013, Pages 1285-1293

  Todorović, Dragan M ^a   Rabasović, Mihailo D ^b   Markushev, Dragan D ^b   Franko, Mladen ^c   Štangar, Urška Lavrenčič ^c  

^a UNIVERSITY OF BELGRADE   (Serbia)

^b UNIVERSITY OF BELGRADE   (Serbia)

^c UNIVERSITY OF NOVA GORICA   (Slovenia)

Author keywords

photoacoustic; thin films; TiO2

Indexed keywords

ELASTIC BENDING; EXPERIMENTAL CONDITIONS; FITTING PROCEDURE; MODULATION FREQUENCIES; PHOTOACOUSTIC; PHOTOACOUSTIC SIGNALS; THEORETICAL MODELS; TIO;

ELASTICITY; SILICON; SUBSTRATES; TITANIUM DIOXIDE;

THIN FILMS;

EID: 84879414326     PISSN: 16747348     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11433-013-5121-6     Document Type: Article

References (19)

1. Mandelis A. Photoacoustic and Thermal Wave Phenomena in Semiconductor. Amsterdam: Elsevier Science, 1987
2. Mandelis A, Hess P. Semiconductors and Electronic Materials. Washington: SPIE Optical Engineering Press, 2000
3. Todorović D M, Nikolić P M. Carrier transport contribution to thermoelastic and electronic deformation in semiconductors. In: Mandelis A, Hess P, eds. Semiconductors and Electronic Materials. Washington: SPIE Optical Engineering Press, 2000. 271-315
4. Todorović D M. Photothermal dynamic elastic bending method. Anal Sci, 2001, 17: s141-s144
5. Todorović D M. Photothermal elastic bending method in investigation of microelectromechanic structures. Rev Sci Instrum, 2003, 74: 578-581
6. Todorović D M, Nikolić P M. Investigation of carrier transport processes in semiconductors by the frequency transmission method. Opt Eng, 1997, 36: 432-445.
7. Opsal J, Rosencwaig A. Thermal and plasma wave depth profiling in silicon. Appl Phys Lett, 1985, 47: 498-500
8. Rosencwaig A. Thermal wave characterization and inspection of semiconductor materials and devices. In: Mandelis A, ed. Photoacoustic and Thermal Wave Phenomena in Semiconductors. New York: Elsivier, 1987
9. Opsal J, Taylor M W, Smith W L, et al. Temporal behavior of modulated optical reflectance in silicon. J Appl Phys, 1987, 61: 240-248
10. Wurm S, Alpern P, Savignac D, et al. Modulated optical reflectance measurements on amorphous silicon layers and detection of residual defects. Appl Phys A, 1988, 47: 147-155
11. Todorović D M, Nikolić P M, Dramićanin M D, et al. Photoacoustic frequency heat-transmission technique: Thermal and carrier transport parameters measurements in silicon. J Appl Phys, 1995, 78: 5750-5755
12. Christofides C, Diakonos F, Seas A, et al. Two-layer model for photomodulated thermoreflectance of semiconductor wafers. J Appl Phys, 1996, 80: 1713-1725
13. Nelson G A C, Francine B G, Shen J, et al. An open-photoacoustic-cell method for thermal characterisation of a two-layer system, J Appl Phys, 2010, 107: 043514
14. Rabasovic M D, Nikolić M G, Dramićanin M D, et al. Low-cost, portable photoacoustic setup for solid samples. Meas Sci Technol, 2009, 20: 095902
15. Stearns R G, Kino G S. Effect of electronic strain on photoacoustic generation in silicon. Appl Phys Lett, 1985, 47: 1048-1050
16. Stearns R G, Kino G S. Photoacoustic techniques for the measurement of electronic properties of semiconductors. In: Mandelis A, ed. Photoacoustic and Thermal Wave Phenomena in Semiconductors. New York: Elsivier, 1987
17. Rosencwaig A, Gersho A. Theory of the photoacoustic effect with solids. J Appl Phys, 1976, 47: 64-69
18. McDonald F, Wetsel G. Generalized theory of the photoacoustic effect. J Appl Phys, 1978, 49: 2313-2322
19. 2 thin films produced by surfactant-assisted sol-gel processing. Thin Solid Films, 2006, 495: 327-332