Silicon nitride CMOS-compatible platform for integrated photonics applications at visible wavelengths

Optics Express

Volumn 21, Issue 12, 2013, Pages 14036-14046

  Romero García, Sebastian ^a   Merget, Florian ^a   Zhong, Frank ^b   Finkelstein, Hod ^b   Witzens, Jeremy ^a  

^a RWTH AACHEN UNIVERSITY   (Germany)

^b ILLUMINA INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC LOSSES; NANOPHOTONICS; PHOTONICS; SILICA;

AQUEOUS ENVIRONMENT; BURIED OXIDE LAYERS; COST-EFFECTIVE SOLUTIONS; HIGH INTEGRATION DENSITY; INTEGRATED PHOTONIC CIRCUIT; INTEGRATED PHOTONICS; MULTIMODE INTERFERENCE COUPLERS; NANOPHOTONIC WAVEGUIDES;

SILICON NITRIDE;

SILICON DERIVATIVE; SILICON NITRIDE;

ARTICLE; CHEMISTRY; EQUIPMENT; EQUIPMENT DESIGN; EQUIPMENT FAILURE; PHOTON; REFRACTOMETRY; SEMICONDUCTOR; SURFACE PLASMON RESONANCE; SYSTEM ANALYSIS; DEVICE FAILURE ANALYSIS; DEVICES;

EQUIPMENT DESIGN; EQUIPMENT FAILURE ANALYSIS; PHOTONS; REFRACTOMETRY; SEMICONDUCTORS; SILICON COMPOUNDS; SURFACE PLASMON RESONANCE; SYSTEMS INTEGRATION;

EID: 84879325438     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.21.014036     Document Type: Article

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