-
1
-
-
84863115324
-
-
10.1002/ppa201100041
-
P. Sun, H. Wu, N. Bai, H. Zhou, R. Wang, H. Feng, W. Zhu, J. Zhang, and J. Fang, Plasma Processes. Polym. 9, 157 (2012). 10.1002/ppap.201100041
-
(2012)
Plasma Processes. Polym.
, vol.9
, pp. 157
-
-
Sun, P.1
Wu, H.2
Bai, N.3
Zhou, H.4
Wang, R.5
Feng, H.6
Zhu, W.7
Zhang, J.8
Fang, J.9
-
2
-
-
84863030731
-
-
10.1088/1367-2630/14/1/013010
-
C. M. Du, J. Wang, L. Zhang, H. X. Li, H. Liu, and Y. Xiong, New J. Phys. 14, 013010 (2012). 10.1088/1367-2630/14/1/013010
-
(2012)
New J. Phys.
, vol.14
, pp. 013010
-
-
Du, C.M.1
Wang, J.2
Zhang, L.3
Li, H.X.4
Liu, H.5
Xiong, Y.6
-
3
-
-
79956024592
-
-
10.1002/ppa201000078
-
N. Bai, P. Sun, H. Zhou, H. Wu, R. Wang, F. Liu, W. Zhu, J. L. Lopez, J. Zhang, and J. Fang, Plasma Processes. Polym. 8, 424 (2011). 10.1002/ppap. 201000078
-
(2011)
Plasma Processes. Polym.
, vol.8
, pp. 424
-
-
Bai, N.1
Sun, P.2
Zhou, H.3
Wu, H.4
Wang, R.5
Liu, F.6
Zhu, W.7
Lopez, J.L.8
Zhang, J.9
Fang, J.10
-
4
-
-
84870451073
-
-
10.1007/s11090-012-9389-5
-
X. Zhang, D. Liu, H. Wang, L. Liu, S. Wang, and S. Yang, Plasma Chem. Plasma Process. 32, 949-957 (2012). 10.1007/s11090-012-9389-5
-
(2012)
Plasma Chem. Plasma Process.
, vol.32
, pp. 949-957
-
-
Zhang, X.1
Liu, D.2
Wang, H.3
Liu, L.4
Wang, S.5
Yang, S.6
-
7
-
-
33745622460
-
-
10.1088/0963-0252/15/3/017
-
J. H. Choi, T. I. Lee, I. Han, H. K. Baik, K. M. Song, Y. S. Lim, and E. S. Lee, Plasma Sources Sci. Technol. 15, 416 (2006). 10.1088/0963-0252/15/3/017
-
(2006)
Plasma Sources Sci. Technol.
, vol.15
, pp. 416
-
-
Choi, J.H.1
Lee, T.I.2
Han, I.3
Baik, H.K.4
Song, K.M.5
Lim, Y.S.6
Lee, E.S.7
-
9
-
-
3242670869
-
-
10.1088/0022-3727/37/14/008
-
V. Linss, H. Kupfer, S. Peter, and F. Richter, J. Phys. D: Appl. Phys. 37, 1935 (2004). 10.1088/0022-3727/37/14/008
-
(2004)
J. Phys. D: Appl. Phys.
, vol.37
, pp. 1935
-
-
Linss, V.1
Kupfer, H.2
Peter, S.3
Richter, F.4
-
10
-
-
40049093562
-
-
10.1063/1.2883945
-
X. Lu, Z. Jiang, Q. Xiong, Z. Tang, X. Hu, and Y. Pan, Appl. Phys. Lett. 92, 81502 (2008). 10.1063/1.2883945
-
(2008)
Appl. Phys. Lett.
, vol.92
, pp. 81502
-
-
Lu, X.1
Jiang, Z.2
Xiong, Q.3
Tang, Z.4
Hu, X.5
Pan, Y.6
-
12
-
-
0030172333
-
-
10.1109/94.506221
-
Y. Zhu, T. Takada, Y. Inoue, and D. Tu, IEEE Trans. Dielectr. Electr. Insul. 3, 460-468 (1996). 10.1109/94.506221
-
(1996)
IEEE Trans. Dielectr. Electr. Insul.
, vol.3
, pp. 460-468
-
-
Zhu, Y.1
Takada, T.2
Inoue, Y.3
Tu, D.4
-
13
-
-
77957732436
-
-
10.1063/1.3476899
-
X. Li, N. Yuan, P. Jia, and J. Chen, Phys. Plasmas 17, 093504 (2010). 10.1063/1.3476899
-
(2010)
Phys. Plasmas
, vol.17
, pp. 093504
-
-
Li, X.1
Yuan, N.2
Jia, P.3
Chen, J.4
-
14
-
-
0037158402
-
-
10.1016/S0040-6090(02)00481-9
-
D. Liu, S. Yu, C. Ren, J. Zhang, and T. Ma, Thin Solid Films 414, 163 (2002). 10.1016/S0040-6090(02)00481-9
-
(2002)
Thin Solid Films
, vol.414
, pp. 163
-
-
Liu, D.1
Yu, S.2
Ren, C.3
Zhang, J.4
Ma, T.5
-
15
-
-
59049091319
-
-
10.1051/epjap:2008198
-
F. U. Khan, N. U. Rehman, S. Naseer, M. A. Naveed, A. Qayyum, N. A. D. Khattak, and M. Zakaullah, Eur. Phys. J.: Appl. Phys. 45, 11002 (2009). 10.1051/epjap:2008198
-
(2009)
Eur. Phys. J.: Appl. Phys.
, vol.45
, pp. 11002
-
-
Khan, F.U.1
Rehman, N.U.2
Naseer, S.3
Naveed, M.A.4
Qayyum, A.5
Khattak, N.A.D.6
Zakaullah, M.7
-
20
-
-
70350648238
-
-
10.1088/0022-3727/42/20/202002
-
W. Zhu, Q. Li, X. Zhu, and Y. Pu, J. Phys. D: Appl. Phys. 42, 202002 (2009). 10.1088/0022-3727/42/20/202002
-
(2009)
J. Phys. D: Appl. Phys.
, vol.42
, pp. 202002
-
-
Zhu, W.1
Li, Q.2
Zhu, X.3
Pu, Y.4
-
21
-
-
0037422652
-
-
10.1088/0022-3727/36/1/306
-
Y. B. Golubovskii, V. A. Maiorov, J. Behnke, and J. F. Behnke, J. Phys. D: Appl. Phys. 36, 39 (2003). 10.1088/0022-3727/36/1/306
-
(2003)
J. Phys. D: Appl. Phys.
, vol.36
, pp. 39
-
-
Golubovskii, Y.B.1
Maiorov, V.A.2
Behnke, J.3
Behnke, J.F.4
-
22
-
-
33750600944
-
-
10.1088/0963-0252/15/4/006
-
A. Sublet, C. Ding, J.-L. Dorier, C. Hollenstein, P. Fayet, and F. Coursimault, Plasma Source Sci. Technol. 15, 627 (2006). 10.1088/0963-0252/15/4/ 006
-
(2006)
Plasma Source Sci. Technol.
, vol.15
, pp. 627
-
-
Sublet, A.1
Ding, C.2
Dorier, J.-L.3
Hollenstein, C.4
Fayet, P.5
Coursimault, F.6
-
23
-
-
67349279391
-
-
10.1016/j.actbio.2009.01.042
-
U. Little, F. Buchana, E. Harkin-Jones, B. Graham, B. Fox, A. Boyd, B. Meenan, and G. Dickson, Acta Biomater. 5, 2025 (2009). 10.1016/j.actbio.2009.01. 042
-
(2009)
Acta Biomater.
, vol.5
, pp. 2025
-
-
Little, U.1
Buchana, F.2
Harkin-Jones, E.3
Graham, B.4
Fox, B.5
Boyd, A.6
Meenan, B.7
Dickson, G.8
-
24
-
-
77950192922
-
-
10.1002/ppa200900070
-
F. Liu, P. Sun, N. Bai, Y. Tian, H. Zhou, S. Wei, Y. Zhou, J. Zhang, W. Zhu, K. Becker, and J. Fang, Plasma Processes. Polym. 7, 231 (2010). 10.1002/ppap.200900070
-
(2010)
Plasma Processes. Polym.
, vol.7
, pp. 231
-
-
Liu, F.1
Sun, P.2
Bai, N.3
Tian, Y.4
Zhou, H.5
Wei, S.6
Zhou, Y.7
Zhang, J.8
Zhu, W.9
Becker, K.10
Fang, J.11
-
25
-
-
79955409473
-
-
10.1063/1.3582923
-
D. Wang, D. Zhao, K. Feng, X. Zhang, D. Liu, and S. Yang, Appl. Phys. Lett. 98, 161501 (2011). 10.1063/1.3582923
-
(2011)
Appl. Phys. Lett.
, vol.98
, pp. 161501
-
-
Wang, D.1
Zhao, D.2
Feng, K.3
Zhang, X.4
Liu, D.5
Yang, S.6
-
29
-
-
78751516834
-
-
10.1063/1.3530434
-
P. Sun, Y. Sun, H. Wu, W. Zhu, J. L. Lopez, W. Liu, J. Zhang, R. Li, and J. Fang, Appl. Phys. Lett. 98, 021501 (2011). 10.1063/1.3530434
-
(2011)
Appl. Phys. Lett.
, vol.98
, pp. 021501
-
-
Sun, P.1
Sun, Y.2
Wu, H.3
Zhu, W.4
Lopez, J.L.5
Liu, W.6
Zhang, J.7
Li, R.8
Fang, J.9
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