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Journal of Non-Crystalline Solids

Volumn 354, Issue 47-51, 2008, Pages 5269-5271

Structural study of undoped and (Mn, In)-doped SnO2 thin films grown by RF sputtering

(4) Espinosa, A a Menendez N b Prieto, C a de Andres A a

a INSTITUTO DE CIENCIA DE MATERIALES DE MADRID (Spain)

b UNIVERSIDAD AUTÓNOMA DE MADRID (Spain)

Author keywords

II VI semiconductors; M ssbauer effect and spectroscopy; TEM; Tin oxide; X ray diffraction

Indexed keywords

DIFFRACTION; ELECTROMAGNETIC WAVES; MAGNETRON SPUTTERING; MANGANESE; MANGANESE COMPOUNDS; MOLYBDENUM; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR GROWTH; SEMICONDUCTOR MATERIALS; SILICON; SUBSTRATES; THICK FILMS; THIN FILMS; TIN; TITANIUM COMPOUNDS; X RAY ANALYSIS; X RAY DIFFRACTION;

ANNEALED FILMS; COLUMNAR GROWTHS; DEPOSITION POWERS; FILMS THICKNESSES; II-VI SEMICONDUCTORS; LOW POWERS; RF MAGNETRON SPUTTERING; RF-SPUTTERING; SECONDARY PHASES; SPUTTERING GAS MIXTURES; STRUCTURAL STUDIES; SUBSTRATE TEMPERATURES; TEM; X-RAY DIFFRACTIONS; X-RAY REFLECTIVITIES;

AMORPHOUS FILMS;

EID: 55349129568 PISSN: 00223093 EISSN: None Source Type: Journal
DOI: 10.1016/j.jnoncrysol.2008.08.018 Document Type: Article

Times cited : (13)

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