Production of photocatalytically active titania layers: A comparison of plasma processes and coating properties

Surface and Coatings Technology

Volumn 227, Issue , 2013, Pages 2-9

  Moser, Eva Maria ^a   Chappuis, Sidney ^a   Olleros, Javier ^b  

^a Department of Library and Information Sciences   (Switzerland)

^b UNIVERSITY OF APPLIED SCIENCES AND ARTS NORTHWESTERN SWITZERLAND   (Switzerland)

Author keywords

PECVD; Photocatalytic activity; PVD; Thin films; Titania

Indexed keywords

EXPERIMENTAL CONDITIONS; METAL ORGANIC CHEMICAL VAPOUR DEPOSITIONS; METHYLENE BLUE DYE; METHYLENE BLUE SOLUTION; PHOTOCATALYTIC ACTIVITIES; REACTIVE DC MAGNETRON SPUTTERING; STRUCTURAL FEATURE; TITANIA;

AROMATIC COMPOUNDS; ATMOSPHERIC PRESSURE; ATOMIC FORCE MICROSCOPY; CARBON; ENERGY GAP; HYDROPHILICITY; HYDROPHOBICITY; METALLORGANIC CHEMICAL VAPOR DEPOSITION; NITROGEN; PHOTOCATALYSIS; PHOTOELECTRONS; PHYSICAL VAPOR DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

TITANIUM DIOXIDE;

EID: 84878369202     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2013.01.050     Document Type: Article

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