Desulfonylation of tosyl amides through catalytic photoredox cleavage of n-s bond under visible-light irradiation

Chemistry - An Asian Journal

Volumn 8, Issue 6, 2013, Pages 1090-1094

  Xuan, Jun ^a   Li, Bin Jie ^a   Feng, Zhu Jia ^a   Sun, Guo Dong ^a   Ma, Huan Huan ^a   Yuan, Zh Wei ^a   Chen, Jia Rong ^a   Lu, Liang Qiu ^a   Xiao, Wen Jing ^a  

^a CENTRAL CHINA NORMAL UNIVERSITY   (China)

Author keywords

desulfonylation; photochemistry; radicals; tosyl amides; visible light

Indexed keywords

AMIDE; TOLUENESULFONIC ACID DERIVATIVE;

CATALYSIS; CHEMICAL STRUCTURE; CHEMISTRY; LIGHT; OXIDATION REDUCTION REACTION; PHOTOCHEMISTRY; RADIATION RESPONSE; ARTICLE; RADIATION EXPOSURE;

AMIDES; CATALYSIS; LIGHT; MOLECULAR STRUCTURE; OXIDATION-REDUCTION; PHOTOCHEMICAL PROCESSES; PHOTOCHEMISTRY; TOSYL COMPOUNDS;

EID: 84878307911     PISSN: 18614728     EISSN: 1861471X     Source Type: Journal    
DOI: 10.1002/asia.201300224     Document Type: Article

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