-
2
-
-
84864751544
-
Functional Block Copolymers: Nanostructured Materials with Emerging Applications
-
Schacher, F. H.; Rupar, P. A.; Manners, I. Functional Block Copolymers: Nanostructured Materials with Emerging Applications Angew. Chem., Int. Ed. 2012, 51 (32) 7898-7921
-
(2012)
Angew. Chem., Int. Ed.
, vol.51
, Issue.32
, pp. 7898-7921
-
-
Schacher, F.H.1
Rupar, P.A.2
Manners, I.3
-
3
-
-
84868382864
-
High Aspect Ratio Sub-15 nm Silicon Trenches from Block Copolymer Templates
-
Gu, X.; Liu, Z.; Gunkel, I.; Chourou, S. T.; Hong, S. W.; Olynick, D. L.; Russell, T. P. High Aspect Ratio Sub-15 nm Silicon Trenches from Block Copolymer Templates Adv. Mater. 2012, 24, 5688-5694
-
(2012)
Adv. Mater.
, vol.24
, pp. 5688-5694
-
-
Gu, X.1
Liu, Z.2
Gunkel, I.3
Chourou, S.T.4
Hong, S.W.5
Olynick, D.L.6
Russell, T.P.7
-
4
-
-
77957304079
-
Ultralarge-Area Block Copolymer Lithography Enabled by Disposable Photoresist Prepatterning
-
Jeong, S.-J.; Moon, H.-S.; Kim, B. H.; Kim, J. Y.; Yu, J.; Lee, S.; Lee, M. G.; Choi, H.; Kim, S. O. Ultralarge-Area Block Copolymer Lithography Enabled by Disposable Photoresist Prepatterning ACS Nano 2010, 4 (9) 5181-5186
-
(2010)
ACS Nano
, vol.4
, Issue.9
, pp. 5181-5186
-
-
Jeong, S.-J.1
Moon, H.-S.2
Kim, B.H.3
Kim, J.Y.4
Yu, J.5
Lee, S.6
Lee, M.G.7
Choi, H.8
Kim, S.O.9
-
5
-
-
0042532330
-
Epitaxial Self-Assembly of Block Copolymers on Lithographically Defined Nanopatterned Substrates
-
Kim, S.; Solak, H.; Stoykovich, M.; Ferrier, N.; de Pablo, J. Epitaxial Self-Assembly of Block Copolymers on Lithographically Defined Nanopatterned Substrates Nature 2003, 424, 411-414
-
(2003)
Nature
, vol.424
, pp. 411-414
-
-
Kim, S.1
Solak, H.2
Stoykovich, M.3
Ferrier, N.4
De Pablo, J.5
-
6
-
-
33846399393
-
Electrospun Polymer Nanofibers with Internal Periodic Structure Obtained by Microphase Separation of Cylindrically Confined Block Copolymers
-
Ma, M.; Krikorian, V.; Yu, J. H.; Thomas, E. L.; Rutledge, G. C. Electrospun Polymer Nanofibers with Internal Periodic Structure Obtained by Microphase Separation of Cylindrically Confined Block Copolymers Nano Lett. 2006, 6 (12) 2969-2972
-
(2006)
Nano Lett.
, vol.6
, Issue.12
, pp. 2969-2972
-
-
Ma, M.1
Krikorian, V.2
Yu, J.H.3
Thomas, E.L.4
Rutledge, G.C.5
-
7
-
-
65249165607
-
Continuous Concentric Lamellar Block Copolymer Nanofibers with Long Range Order
-
Ma, M.; Titievsky, K.; Thomas, E. L.; Rutledge, G. C. Continuous Concentric Lamellar Block Copolymer Nanofibers with Long Range Order Nano Lett. 2009, 9 (4) 1678-1683
-
(2009)
Nano Lett.
, vol.9
, Issue.4
, pp. 1678-1683
-
-
Ma, M.1
Titievsky, K.2
Thomas, E.L.3
Rutledge, G.C.4
-
8
-
-
54049155145
-
Frustrated Phases of Block Copolymers in Nanoparticles
-
Higuchi, T.; Tajima, A.; Motoyoshi, K.; Yabu, H.; Shimomura, M. Frustrated Phases of Block Copolymers in Nanoparticles Angew. Chem., Int. Ed. 2008, 47 (42) 8044-8046
-
(2008)
Angew. Chem., Int. Ed.
, vol.47
, Issue.42
, pp. 8044-8046
-
-
Higuchi, T.1
Tajima, A.2
Motoyoshi, K.3
Yabu, H.4
Shimomura, M.5
-
9
-
-
24644451187
-
Unique Phase-Separation Structures of Block-Copolymer Nanoparticles
-
Yabu, H.; Higuchi, T.; Shimomura, M. Unique Phase-Separation Structures of Block-Copolymer Nanoparticles Adv. Mater. 2005, 17 (17) 2062-2065
-
(2005)
Adv. Mater.
, vol.17
, Issue.17
, pp. 2062-2065
-
-
Yabu, H.1
Higuchi, T.2
Shimomura, M.3
-
10
-
-
84858684400
-
Three-Dimensional Observation of Confined Phase-Separated Structures in Block Copolymer Nanoparticles
-
Higuchi, T.; Motoyoshi, K.; Sugimori, H.; Jinnai, H.; Yabu, H.; Shimomura, M. Three-Dimensional Observation of Confined Phase-Separated Structures in Block Copolymer Nanoparticles Soft Matter 2012, 8 (14) 3791-3797
-
(2012)
Soft Matter
, vol.8
, Issue.14
, pp. 3791-3797
-
-
Higuchi, T.1
Motoyoshi, K.2
Sugimori, H.3
Jinnai, H.4
Yabu, H.5
Shimomura, M.6
-
11
-
-
69249179108
-
Hierarchically Structured Colloids of Diblock Copolymers and Au Nanoparticles
-
Jeon, S.-J.; Yang, S.-M.; Kim, B. J.; Petrie, J. D.; Jang, S. G.; Kramer, E. J.; Pine, D. J.; Yi, G.-R. Hierarchically Structured Colloids of Diblock Copolymers and Au Nanoparticles Chem. Mater. 2009, 21 (16) 3739-3741
-
(2009)
Chem. Mater.
, vol.21
, Issue.16
, pp. 3739-3741
-
-
Jeon, S.-J.1
Yang, S.-M.2
Kim, B.J.3
Petrie, J.D.4
Jang, S.G.5
Kramer, E.J.6
Pine, D.J.7
Yi, G.-R.8
-
12
-
-
0037100942
-
Phase Behavior in Thin Films of Cylinder-Forming Block Copolymers
-
Knoll, A.; Horvat, A.; Lyakhova, K.; Krausch, G.; Sevink, G.; Zvelindovsky, A. V.; Magerle, R. Phase Behavior in Thin Films of Cylinder-Forming Block Copolymers Phys. Rev. Lett. 2002, 89 (3) 035501
-
(2002)
Phys. Rev. Lett.
, vol.89
, Issue.3
, pp. 035501
-
-
Knoll, A.1
Horvat, A.2
Lyakhova, K.3
Krausch, G.4
Sevink, G.5
Zvelindovsky, A.V.6
Magerle, R.7
-
13
-
-
35348814310
-
Origin of Microstructures from Confined Asymmetric Diblock Copolymers
-
Chen, P.; Liang, H.; Shi, A.-C. Origin of Microstructures from Confined Asymmetric Diblock Copolymers Macromolecules 2007, 40 (20) 7329-7335
-
(2007)
Macromolecules
, vol.40
, Issue.20
, pp. 7329-7335
-
-
Chen, P.1
Liang, H.2
Shi, A.-C.3
-
14
-
-
84872055881
-
Self-Assembly of Diblock Copolymers under Confinement
-
in press
-
Shi, A. C.; Li, B., Self-Assembly of Diblock Copolymers under Confinement. Soft Matter 2013, in press.
-
(2013)
Soft Matter
-
-
Shi, A.C.1
Li, B.2
-
15
-
-
71549134010
-
Cylindrically Confined Diblock Copolymers
-
Dobriyal, P.; Xiang, H.; Kazuyuki, M.; Chen, J.-T.; Jinnai, H.; Russell, T. P. Cylindrically Confined Diblock Copolymers Macromolecules 2009, 42 (22) 9082-9088
-
(2009)
Macromolecules
, vol.42
, Issue.22
, pp. 9082-9088
-
-
Dobriyal, P.1
Xiang, H.2
Kazuyuki, M.3
Chen, J.-T.4
Jinnai, H.5
Russell, T.P.6
-
16
-
-
66749176700
-
Soft Graphoepitaxy of Block Copolymer Assembly with Disposable Photoresist Confinement
-
Jeong, S.-J.; Kim, J. E.; Moon, H.-S.; Kim, B. H.; Kim, S. M.; Kim, J. B.; Kim, S. O. Soft Graphoepitaxy of Block Copolymer Assembly with Disposable Photoresist Confinement Nano Lett. 2009, 9 (6) 2300-2305
-
(2009)
Nano Lett.
, vol.9
, Issue.6
, pp. 2300-2305
-
-
Jeong, S.-J.1
Kim, J.E.2
Moon, H.-S.3
Kim, B.H.4
Kim, S.M.5
Kim, J.B.6
Kim, S.O.7
-
17
-
-
49249124013
-
Ordering of PS-b-P4VP on Patterned Silicon Surfaces
-
Park, S.; Kim, B.; Yavuzcetin, O.; Tuominen, M. T.; Russell, T. P. Ordering of PS-b-P4VP on Patterned Silicon Surfaces ACS Nano 2008, 2 (7) 1363-1370
-
(2008)
ACS Nano
, vol.2
, Issue.7
, pp. 1363-1370
-
-
Park, S.1
Kim, B.2
Yavuzcetin, O.3
Tuominen, M.T.4
Russell, T.P.5
-
18
-
-
54949119540
-
Hierachical Self-Assembly of Block Copolymers for Lithography-Free Nanopatterning
-
Kim, B. H.; Shin, D. O.; Jeong, S.-J.; Koo, C. M.; Jeon, S. C.; Hwang, W. J.; Lee, S.; Lee, M. G.; Kim, S. O. Hierachical Self-Assembly of Block Copolymers for Lithography-Free Nanopatterning Adv. Mater. 2008, 20, 2303-2307
-
(2008)
Adv. Mater.
, vol.20
, pp. 2303-2307
-
-
Kim, B.H.1
Shin, D.O.2
Jeong, S.-J.3
Koo, C.M.4
Jeon, S.C.5
Hwang, W.J.6
Lee, S.7
Lee, M.G.8
Kim, S.O.9
-
19
-
-
70349239270
-
Spontaneous Lamellar Alignment in Thickness-Modulated Block Copolymer Films
-
Kim, B. H.; Lee, H. M.; Lee, J.-H.; Son, S.-W.; Jeong, S.-J.; Lee, S.; Lee, D. I.; Kwak, S. U.; Jeong, H.; Shin, H.; Yoon, J.-B.; Lavrentovich, O. D.; Kim, S. O. Spontaneous Lamellar Alignment in Thickness-Modulated Block Copolymer Films Adv. Funct. Mater. 2009, 19, 2584-2591
-
(2009)
Adv. Funct. Mater.
, vol.19
, pp. 2584-2591
-
-
Kim, B.H.1
Lee, H.M.2
Lee, J.-H.3
Son, S.-W.4
Jeong, S.-J.5
Lee, S.6
Lee, D.I.7
Kwak, S.U.8
Jeong, H.9
Shin, H.10
Yoon, J.-B.11
Lavrentovich, O.D.12
Kim, S.O.13
-
20
-
-
66549109928
-
One-Dimensional Nanoassembly of Block Copolymers Tailored by Chemically Patterned Surfaces
-
Shin, D. O.; Kim, B. H.; Kang, J.-H.; Jeong, S.-J.; Park, S. H.; Lee, Y.-H.; Kim, S. O. One-Dimensional Nanoassembly of Block Copolymers Tailored by Chemically Patterned Surfaces Macromolecules 2009, 42 (4) 1189-1193
-
(2009)
Macromolecules
, vol.42
, Issue.4
, pp. 1189-1193
-
-
Shin, D.O.1
Kim, B.H.2
Kang, J.-H.3
Jeong, S.-J.4
Park, S.H.5
Lee, Y.-H.6
Kim, S.O.7
-
21
-
-
33847727085
-
Solvent Annealed Thin Films of Asymmetric Polyisoprene-Polylactide Diblock Copolymers
-
Cavicchi, K. A.; Russell, T. P. Solvent Annealed Thin Films of Asymmetric Polyisoprene-Polylactide Diblock Copolymers Macromolecules 2007, 40 (4) 1181-1186
-
(2007)
Macromolecules
, vol.40
, Issue.4
, pp. 1181-1186
-
-
Cavicchi, K.A.1
Russell, T.P.2
-
22
-
-
78649560911
-
Fast Assembly of Ordered Block Copolymer Nanostructures through Microwave Annealing
-
Zhang, X.; Harns, K. D.; Wu, N. L. Y.; Murphy, J. N.; Buriak, J. M. Fast Assembly of Ordered Block Copolymer Nanostructures through Microwave Annealing ACS Nano 2010, 4 (11) 7021-7029
-
(2010)
ACS Nano
, vol.4
, Issue.11
, pp. 7021-7029
-
-
Zhang, X.1
Harns, K.D.2
Wu, N.L.Y.3
Murphy, J.N.4
Buriak, J.M.5
-
23
-
-
43749087585
-
Spontaneous Formation of Polymer Nanoparticles with Inner Micro Phase Separtion Structures
-
Higuchi, T.; Tajima, A.; Yabu, H.; Shimomura, M. Spontaneous Formation of Polymer Nanoparticles with Inner Micro Phase Separtion Structures Soft Matter 2008, 4, 1302-1305
-
(2008)
Soft Matter
, vol.4
, pp. 1302-1305
-
-
Higuchi, T.1
Tajima, A.2
Yabu, H.3
Shimomura, M.4
-
24
-
-
84869071459
-
Mesostructured Block Copolymer Nanoparticles: Versatile Templates for Hybrid Inorganic/Organic Nanostructures
-
Connal, L. A.; Lynd, N. A.; Robb, M. J.; See, K. A.; Jang, S. G.; Spruell, J. M.; Hawker, C. J. Mesostructured Block Copolymer Nanoparticles: Versatile Templates for Hybrid Inorganic/Organic Nanostructures Chem. Mater. 2102, 24, 4036-4042
-
(2102)
Chem. Mater.
, vol.24
, pp. 4036-4042
-
-
Connal, L.A.1
Lynd, N.A.2
Robb, M.J.3
See, K.A.4
Jang, S.G.5
Spruell, J.M.6
Hawker, C.J.7
-
25
-
-
84864488940
-
Order-Order Phase Transition and Transformation in Co-assembled Particles from Fluorinated FA/FB Type Diblock Copolymers
-
Qin, S.; Yuan, W. Z.; Li, H.; Zhang, Y. Order-Order Phase Transition and Transformation in Co-assembled Particles from Fluorinated FA/FB Type Diblock Copolymers Soft Matter 2012, 8 (32) 8405-8412
-
(2012)
Soft Matter
, vol.8
, Issue.32
, pp. 8405-8412
-
-
Qin, S.1
Yuan, W.Z.2
Li, H.3
Zhang, Y.4
-
26
-
-
79960011151
-
-
Huh, J.; Jung, J. Y.; Lee, J. U.; Cho, H.; Park, S.; Park, C.; Jo, W. H. ACS Nano 2011, 5 (1) 115-122
-
(2011)
ACS Nano
, vol.5
, Issue.1
, pp. 115-122
-
-
Huh, J.1
Jung, J.Y.2
Lee, J.U.3
Cho, H.4
Park, S.5
Park, C.6
Jo, W.H.7
-
27
-
-
78249238486
-
Phase Transition and Phase Transformation in Block Copolymer Nanoparticles
-
Higuchi, T.; Motoyoshi, K.; Sugimori, H.; Jinnai, H.; Yabu, H.; Shimomura, M. Phase Transition and Phase Transformation in Block Copolymer Nanoparticles Macromol. Rapid Commun. 2010, 31 (20) 1773-1778
-
(2010)
Macromol. Rapid Commun.
, vol.31
, Issue.20
, pp. 1773-1778
-
-
Higuchi, T.1
Motoyoshi, K.2
Sugimori, H.3
Jinnai, H.4
Yabu, H.5
Shimomura, M.6
-
28
-
-
78651340622
-
Solvent-Driven Evolution of Block Copolymer Morphology under 3D Confinement
-
Le, L.; Matsunaga, K.; Zhu, J.; Higuchi, T.; Yabu, H.; Shimomura, M.; Jinnai, H.; Hayword, R. C.; Russell, T. P. Solvent-Driven Evolution of Block Copolymer Morphology under 3D Confinement Macromolecules 2010, 43 (18) 7807-7812
-
(2010)
Macromolecules
, vol.43
, Issue.18
, pp. 7807-7812
-
-
Le, L.1
Matsunaga, K.2
Zhu, J.3
Higuchi, T.4
Yabu, H.5
Shimomura, M.6
Jinnai, H.7
Hayword, R.C.8
Russell, T.P.9
-
29
-
-
29844438377
-
Spontaneous Formation of Polymer Nanoparticles by Good-Solvent Evaporation As a Nonequilibrium Process
-
Yabu, H.; Higuchi, T.; Ijiro, K.; Shimomura, M. Spontaneous Formation of Polymer Nanoparticles by Good-Solvent Evaporation As a Nonequilibrium Process Chaos 2005, 15 (4) 047505
-
(2005)
Chaos
, vol.15
, Issue.4
, pp. 047505
-
-
Yabu, H.1
Higuchi, T.2
Ijiro, K.3
Shimomura, M.4
|