High near-infrared emission intensity of Er3+-doped zirconium oxide films on a Si(100) substrate

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 8621, Issue , 2013, Pages

  Rivera, V A G ^a   Ferri, F A ^a   Clabel H , J L ^b   Kawamura, M K ^a   Pereira Da Silva, M A ^a,c   Nunes, L A O ^a   Li, M S ^a   Marega, E ^a  

^a UNIVERSITY OF SÃO PAULO   (Brazil)

^b FEDERAL UNIVERSITY OF SÃO CARLOS   (Brazil)

^c Centro Universitario Central Paulista   (Brazil)

Author keywords

rare earth doped; spectroscopy; thin film

Indexed keywords

ANNEALING; ENERGY TRANSFER; ERBIUM COMPOUNDS; INFRARED DEVICES; LUMINESCENCE; OXIDE FILMS; RARE EARTHS; VACUUM EVAPORATION; X RAY DIFFRACTION; ZIRCONIUM COMPOUNDS;

ELECTRON BEAM EVAPORATION; EMISSIONS INTENSITY; ERBIUM DOPED; FURNACE ANNEALING; HIGH VACUUM; HIGH-CRYSTALLINE QUALITY; NEAR-INFRARED EMISSIONS; RARE EARTH DOPED; THIN-FILMS; ZIRCONIUM OXIDE FILMS;

THIN FILMS;

EID: 84878163055     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.2004783     Document Type: Conference Paper

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