Enhanced resputtering and asymmetric interface mixing in W/Si multilayers

Applied Physics A: Materials Science and Processing

Volumn 111, Issue 2, 2013, Pages 431-437

  Eberl, Christian ^a   Liese, Tobias ^a   Schlenkrich, Felix ^a   Döring, Florian ^a   Hofsäss, Hans ^a   Krebs, Hans Ulrich ^a  

^a UNIVERSITY OF GÖTTINGEN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ASYMMETRIC INTERFACE; COMPLEMENTARY METHODS; DEPOSITION CONDITIONS; MULTILAYER GROWTH; SUBSTRATE SURFACE; THEORETICAL CALCULATIONS; TRANSMISSION ELECTRON MICROSCOPY (TEM); X RAY REFLECTIVITY;

KINETICS; MIXING; PULSED LASER DEPOSITION; SILICON; TRANSMISSION ELECTRON MICROSCOPY;

MULTILAYERS;

EID: 84878151008     PISSN: 09478396     EISSN: 14320630     Source Type: Journal    
DOI: 10.1007/s00339-013-7587-5     Document Type: Article

References (18)

1. D.B. Chrisey, G.K. Hubler, Pulsed Laser Deposition of Thin Films (Wiley, New York, 1994)
2. R. Eason, Pulsed Laser Deposition of Thin Films (Wiley, New York, 2007)
3. H.U. Krebs, Characteristic properties of laser deposited metallic systems. Int. J. Non-Equilib. Process. 10, 3-24 (1997)
4. J.G. Lunney, Pulsed laser deposition of metal and metal multilayer films. Appl. Surf. Sci. 86, 79-85 (1995)
5. S. Fähler, H.U. Krebs, Calculations and experiments of material removal and kinetic energy during pulsed laser ablation of metals. Appl. Surf. Sci. 96-98, 61-65 (1996)
6. H. Frey, G. Kienel, Dünnschichttechnologie (VDI, Düsseldorf, 1987), p. 103
7. S. Fähler, K. Sturm, H.U. Krebs, Resputtering during the growth of pulsed-laser-deposited metallic films in vacuum and in an ambient gas. Appl. Phys. Lett. 75, 3766-3768 (1999)
8. 3 employing reactive serial co-sputtering: process characteristics and resulting film properties. J. Phys. D 44, 345501 (2011)
9. S. Berg, A.M. Barklund, B. Gelin, C. Nender, I. Katardjiev, Atom assisted sputtering yield amplification. J. Vac. Sci. Technol. A 10, 1592-1596 (1992)
10. E. Spiller, Soft X-ray Optics (SPIE Optical Engineering Press, Bellingham, 1994)
11. A. Ruhlandt, T. Liese, V. Radisch, S. Krüger, M. Osterhoff, K. Giewekemeyer, H.U. Krebs, T. Salditt, A combined Kirkpatrick-Baez mirror and multilayer lens for sub-10 nm X-ray focusing. AIP Adv. 2, 012175 (2012)
12. H.U. Krebs, O. Bremert, Pulsed laser deposition of thin metallic alloys. Appl. Phys. Lett. 62, 2341-2343 (1993)
13. J.F. Ziegler, J.P. Biersack, M.D. Ziegler, SRIM - the Stopping and Range of Ions in Matter (SRIM Co., Chester, 2008)
14. W. Möller, W. Eckstein, Tridyn - a TRIM simulation code including dynamic composition changes. Nucl. Instrum. Methods Phys. Res., Sect. B, Beam Interact. Mater. Atoms 2, 814-818 (1984)
15. D.L. Windt, IMD - software for modeling the optical properties of multilayer films. Comput. Phys. 12, 360-370 (1998)
16. H. Windischmann, An intrinsic stress scaling law for polycrystalline thin films prepared by ion beam sputtering. J. Appl. Phys. 62, 1800-1807 (1987)
17. Y. Yamamura, H. Tawara, Energy dependence of ion-induced sputtering yields from monatomic solids at normal incidence. At. Data Nucl. Data Tables 62, 149-253 (1996)
18. S. Fähler, S. Kahl, M. Weisheit, K. Sturm, H.U. Krebs, The interface of laser deposited Cu/Ag multilayers: evidence for the 'subsurface growth mode' during pulsed laser deposition. Appl. Surf. Sci. 154-155, 419-423 (2000)