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Volumn 113, Issue 17, 2013, Pages

Ultrathin magnetic oxide EuO films on Si(001) using SiOx passivation-Controlled by hard x-ray photoemission spectroscopy

(7) Caspers, C a Flade, S a Gorgoi, M b Gloskovskii, A c Drube, W c Schneider, C M a,d Muller M a

a FORSCHUNGSZENTRUM JÜLICH (Germany)

b HAHN MEITNER INSTITUT (Germany)

c DESY (Germany)

d UNIVERSITY OF DUISBURG ESSEN (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

HARD X-RAY PHOTOEMISSION SPECTROSCOPY; INTERFACE-SENSITIVE; MAGNETIC OXIDES; SI(0 0 1); SI(001) SURFACES; SUBMONOLAYER COVERAGE; TUNNEL CONTACTS; ULTRA-THIN;

EPITAXIAL GROWTH; MONOLAYERS; OXIDE FILMS; PASSIVATION; PHOTOELECTRON SPECTROSCOPY; SILICIDES; SILICON; SILICON OXIDES; STRUCTURAL OPTIMIZATION; X RAYS;

ULTRATHIN FILMS;

EID: 84877781981 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.4795010 Document Type: Conference Paper

Times cited : (24)

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