-
1
-
-
0141596652
-
-
10.1063/1.121982
-
J. Blochwitz, M. Pfeiffer, T. Fritz, and K. Leo, Appl. Phys. Lett. 73, 729 (1998). 10.1063/1.121982
-
(1998)
Appl. Phys. Lett.
, vol.73
, pp. 729
-
-
Blochwitz, J.1
Pfeiffer, M.2
Fritz, T.3
Leo, K.4
-
2
-
-
77953007242
-
-
10.1002/adfm.201000137
-
K. S. Yook, S. O. Jeon, S.-Y. Min, J. Y. Lee, H.-J. Yang, T. Noh, S.-K. Kang, and T.-W. Lee, Adv. Funct. Mater. 20, 1797 (2010). 10.1002/adfm.201000137
-
(2010)
Adv. Funct. Mater.
, vol.20
, pp. 1797
-
-
Yook, K.S.1
Jeon, S.O.2
Min, S.-Y.3
Lee, J.Y.4
Yang, H.-J.5
Noh, T.6
Kang, S.-K.7
Lee, T.-W.8
-
3
-
-
36048958904
-
-
10.1063/1.2754635
-
D.-S. Leem, H.-D. Park, J.-W. Kang, J.-H. Lee, J. W. Kim, and J.-J. Kim, Appl. Phys. Lett. 91, 011113 (2007). 10.1063/1.2754635
-
(2007)
Appl. Phys. Lett.
, vol.91
, pp. 011113
-
-
Leem, D.-S.1
Park, H.-D.2
Kang, J.-W.3
Lee, J.-H.4
Kim, J.W.5
Kim, J.-J.6
-
4
-
-
84862807177
-
-
10.1016/j.orgel.2011.11.023
-
G. Chauhan, R. Srivastava, A. Kumar, O. Rana, P. C. Srivastava, and M. N. Kamalasanan, Org. Electron. 13, 394 (2012). 10.1016/j.orgel.2011.11.023
-
(2012)
Org. Electron.
, vol.13
, pp. 394
-
-
Chauhan, G.1
Srivastava, R.2
Kumar, A.3
Rana, O.4
Srivastava, P.C.5
Kamalasanan, M.N.6
-
5
-
-
77953007624
-
-
10.1063/1.3428374
-
X. Qiao, J. Chen, X. Li, and D. Ma, J. Appl. Phys. 107, 104505 (2010). 10.1063/1.3428374
-
(2010)
J. Appl. Phys.
, vol.107
, pp. 104505
-
-
Qiao, X.1
Chen, J.2
Li, X.3
Ma, D.4
-
7
-
-
0035891424
-
-
10.1103/PhysRevB.64.195208
-
B. Maennig, M. Pfeiffer, A. Nollau, X. Zhou, K. Leo, and P. Simon, Phys. Rev. B 64, 195208 (2001). 10.1103/PhysRevB.64.195208
-
(2001)
Phys. Rev. B
, vol.64
, pp. 195208
-
-
Maennig, B.1
Pfeiffer, M.2
Nollau, A.3
Zhou, X.4
Leo, K.5
Simon, P.6
-
11
-
-
41549168210
-
-
10.1063/1.2884711
-
P. L. Bullejos, J. A. J. Tejada, M. J. Deen, O. Marinov, and W. R. Datars, J. Appl. Phys. 103, 064504 (2008). 10.1063/1.2884711
-
(2008)
J. Appl. Phys.
, vol.103
, pp. 064504
-
-
Bullejos, P.L.1
Tejada, J.A.J.2
Deen, M.J.3
Marinov, O.4
Datars, W.R.5
-
12
-
-
50249180153
-
-
10.1063/1.2973151
-
G. Schwartz, T.-H. Ke, C.-C. Wu, K. Walzer, and K. Leo, Appl. Phys. Lett. 93, 073304 (2008). 10.1063/1.2973151
-
(2008)
Appl. Phys. Lett.
, vol.93
, pp. 073304
-
-
Schwartz, G.1
Ke, T.-H.2
Wu, C.-C.3
Walzer, K.4
Leo, K.5
-
13
-
-
2442661583
-
-
10.1002/cphc.200300942
-
Y. Shen, A. R. Hosseini, M. H. Wong, and G. G. Malliaras, ChemPhysChem 5, 16 (2004). 10.1002/cphc.200300942
-
(2004)
ChemPhysChem
, vol.5
, pp. 16
-
-
Shen, Y.1
Hosseini, A.R.2
Wong, M.H.3
Malliaras, G.G.4
-
14
-
-
15744388952
-
-
10.1103/PhysRevB.71.045214
-
V. I. Arkhipov, P. Heremans, E. V. Emelianova, and H. Bässler, Phys. Rev. B 71, 045214 (2005). 10.1103/PhysRevB.71.045214
-
(2005)
Phys. Rev. B
, vol.71
, pp. 045214
-
-
Arkhipov, V.I.1
Heremans, P.2
Emelianova, E.V.3
Bässler, H.4
-
15
-
-
29744446836
-
-
10.1103/PhysRevB.72.235202
-
V. I. Arkhipov, E. V. Emelianova, P. Heremans, and H. Bässler, Phys. Rev. B 72, 235202 (2005). 10.1103/PhysRevB.72.235202
-
(2005)
Phys. Rev. B
, vol.72
, pp. 235202
-
-
Arkhipov, V.I.1
Emelianova, E.V.2
Heremans, P.3
Bässler, H.4
-
17
-
-
79955704005
-
-
10.1063/1.3569144
-
J.-H. Lee, H.-M. Kim, K.-B. Kim, R. Kabe, P. Anzenbacher, Jr., and J.-J. Kim, Appl. Phys. Lett. 98, 173303 (2011). 10.1063/1.3569144
-
(2011)
Appl. Phys. Lett.
, vol.98
, pp. 173303
-
-
Lee, J.-H.1
Kim, H.-M.2
Kim, K.-B.3
Kabe, R.4
Anzenbacher, Jr.P.5
Kim, J.-J.6
-
18
-
-
79953269809
-
-
10.1016/j.orgel.2011.03.008
-
J.-H. Lee, H.-M. Kim, K.-B. Kim, and J.-J. Kim, Org. Electron. 12, 950 (2011). 10.1016/j.orgel.2011.03.008
-
(2011)
Org. Electron.
, vol.12
, pp. 950
-
-
Lee, J.-H.1
Kim, H.-M.2
Kim, K.-B.3
Kim, J.-J.4
-
19
-
-
84877776916
-
-
See supplementary material at E-APPLAB-102-030319 for formation of the ohmic contact using a heavily doped interfacial layer.
-
See supplementary material at http://dx.doi.org/10.1063/1.4804141 E-APPLAB-102-030319 for formation of the ohmic contact using a heavily doped interfacial layer.
-
-
-
-
20
-
-
9344251702
-
-
10.1016/j.synthmet.2004.08.014
-
S. Grecu, M. Bronner, A. Opitz, and W. Brütting, Synth. Met. 146, 359 (2004). 10.1016/j.synthmet.2004.08.014
-
(2004)
Synth. Met.
, vol.146
, pp. 359
-
-
Grecu, S.1
Bronner, M.2
Opitz, A.3
Brütting, W.4
-
21
-
-
84877754289
-
-
J.-H. Lee, D.-S. Leem, H.-J. Kim, and J.-J. Kim, SID Int. Symp. Digest Tech. Papers 2009, P-161.
-
SID Int. Symp. Digest Tech. Papers
, vol.2009
, pp. 161
-
-
Lee, J.-H.1
Leem, D.-S.2
Kim, H.-J.3
Kim, J.-J.4
-
22
-
-
84864606280
-
-
10.1103/PhysRevB.86.035320
-
M. L. Tietze, L. Burtone, M. Riede, B. Lüssem, and K. Leo, Phys. Rev. B 86, 035320 (2012). 10.1103/PhysRevB.86.035320
-
(2012)
Phys. Rev. B
, vol.86
, pp. 035320
-
-
Tietze, M.L.1
Burtone, L.2
Riede, M.3
Lüssem, B.4
Leo, K.5
-
23
-
-
84863333497
-
-
10.1016/j.orgel.2012.05.025
-
P. L. Varo, J. A. J. Tejada, J. A. L. Villanueva, J. E. Carceller, and M. J. Deen, Org. Electron. 13, 1700 (2012). 10.1016/j.orgel.2012.05.025
-
(2012)
Org. Electron.
, vol.13
, pp. 1700
-
-
Varo, P.L.1
Tejada, J.A.J.2
Villanueva, J.A.L.3
Carceller, J.E.4
Deen, M.J.5
-
25
-
-
84987058072
-
-
10.1002/pssb.2221750102
-
H. Bässler, Phys. Status Solidi B 175, 15 (1993). 10.1002/pssb.2221750102
-
(1993)
Phys. Status Solidi B
, vol.175
, pp. 15
-
-
Bässler, H.1
-
26
-
-
18744394830
-
-
10.1103/PhysRevLett.93.166601
-
I. N. Hulea, H. B. Brom, A. J. Houtepen, D. Vanmaekelbergh, J. J. Kelly, and E. A. Meulenkamp, Phys. Rev. Lett. 93, 166601 (2004). 10.1103/PhysRevLett. 93.166601
-
(2004)
Phys. Rev. Lett.
, vol.93
, pp. 166601
-
-
Hulea, I.N.1
Brom, H.B.2
Houtepen, A.J.3
Vanmaekelbergh, D.4
Kelly, J.J.5
Meulenkamp, E.A.6
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