Non-stoichiometry in oxide thin films: A chemical capacitance study of the praseodymium-cerium oxide system

Advanced Functional Materials

Volumn 23, Issue 17, 2013, Pages 2168-2174

  Chen, Di ^a   Bishop, Sean R ^a,b   Tuller, Harry L ^a  

^a Massachusetts Institute of Technology Cambridge   (United States)

^b KYUSHU UNIVERSITY   (Japan)

Author keywords

ceria; chemical capacitance; non stoichiometry; oxygen storage; thin films

Indexed keywords

CHEMICAL CAPACITANCE; IMPEDANCE SPECTROSCOPY; NON-STOICHIOMETRY; OXYGEN NON-STOICHIOMETRY; OXYGEN PARTIAL PRESSURE; OXYGEN STORAGE; PRASEODYMIUM-CERIUM OXIDE; THERMODYNAMIC CONSTANTS;

CAPACITANCE; CERIUM COMPOUNDS; CHEMICAL ANALYSIS; DEFECTS; OXIDE FILMS; OXYGEN; PRASEODYMIUM; STOICHIOMETRY; THERMOGRAVIMETRIC ANALYSIS; THIN FILMS;

CERIUM;

EID: 84877275946     PISSN: 1616301X     EISSN: 16163028     Source Type: Journal    
DOI: 10.1002/adfm.201202104     Document Type: Article

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