Study of amorphous lithium silicate thin films grown by atomic layer deposition

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 30, Issue 1, 2012, Pages

  Hämäläinen, Jani ^a   Munnik, Frans ^b   Hatanpää, Timo ^a   Holopainen, Jani ^a   Ritala, Mikko ^a   Leskelä, Markku ^a  

^a UNIVERSITY OF HELSINKI   (Finland)

^b INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYER; DEPOSITION CYCLES; DEPOSITION TEMPERATURES; FILM COMPOSITION; GROWTH BEHAVIOR; HYDROGEN IMPURITY; LITHIUM HEXAMETHYLDISILAZIDE; LITHIUM METASILICATE; LITHIUM SILICATES; LITHIUM-ION BATTERY; OZONE PRECURSORS; PARTIAL DECOMPOSITION; THICKNESS DEPENDENCE;

AMORPHOUS FILMS; AMORPHOUS MATERIALS; ATOMIC LAYER DEPOSITION; DEPOSITION; FILM GROWTH; GROWTH RATE; HYDROGEN; LITHIUM COMPOUNDS; OZONE; REFRACTIVE INDEX; SILICATES; STOICHIOMETRY; SURFACE REACTIONS; THIN FILMS; VAPOR DEPOSITION;

LITHIUM;

EID: 84855613042     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3643349     Document Type: Article

References (29)

1. Joint Committee on Powder Diffraction Standards File Nos. 00-029-0828, 00-037-1472, 00-040-0376, and 00-042-0403.
2. A. Nakagawa, N. Kuwata, Y. Matsuda, and J. Kawamura, J. Phys. Soc. Jpn. Supplement A 79, 98 (2010).
3. S. Furusawa, A. Kamiyama, and T. Tsurui, Solid State Ionics 179, 536 (2008). 10.1016/j.ssi.2008.03.040
4. S. Furusawa, T. Kasahara, and A. Kamiyama, Solid State Ionics 180, 649 (2009). 10.1016/j.ssi.2008.12.031
5. J -H. Ahn, Y -J. Kim, and G. Wang, Nanoscale Res. Lett. 5, 1841 (2010). 10.1007/s11671-010-9722-y
6. Q. Sun, B. Zhang, and Z -W. Fu, Appl. Surf. Sci. 254, 3774 (2008). 10.1016/j.apsusc.2007.11.058
7. A. Sakuda, H. Kitaura, A. Hayashi, K. Tadanaga, and M. Tatsumisago, Electrochem. Solid-State Lett. 11, A1 (2008). 10.1149/1.2795837 (Pubitemid 350115951)
8. K. Ben Saad, H. Hamzaoui, A. Labidi, and B. Bessas, Appl. Surf. Sci. 254, 3955 (2008). 10.1016/j.apsusc.2007.12.027
9. M. Matsui, J. Ceram. Soc. Jpn. 111, 848 (2003). 10.2109/jcersj.111.848
10. T. Yamaguchi, T. Niitsuma, B. N. Nair, and K. Nakagawa, J. Membr. Sci. 294, 16 (2007). 10.1016/j.memsci.2007.01.028 (Pubitemid 46550317)
11. A. K. Suri, N. Krishnamurthy, and I. S. Batra, J. Phys.: Conf. Ser. 208, 012001 (2010). 10.1088/1742-6596/208/1/012001
12. M. Ritala and M. Leskelä, in Handbook of Thin Film Materials, edited by, H. S. Nalwa, (Academic, San Diego, 2001), Vol. 1, pp. 103-156.
13. M. Ritala and J. Niinistö, in Chemical Vapor Deposition: Precursors, Processes and Applications, edited by, A. C. Jones, and, M. L. Hitchman, (The Royal Society of Chemistry, Cambridge, UK, 2009), pp. 158-206.
14. J. F. M. Oudenhoven, L. Baggetto, and P. H. L. Notten, Adv. Energy Mater. 1, 10 (2011). 10.1002/aenm.201000002
15. H. C. M. Knoops, M. E. Donders, L. Baggetto, M. C. M. van de Sanden, P H. L. Notten, and W. M. M. Kessels, ECS Trans. 25, 333 (2009). 10.1149/1.3205068
16. M. E. Donders, J. F. M. Oudenhoven, L. Baggetto, H. C. M. Knoops, M. C. M. van de Sanden, W. M. M. Kessels, and P. H. L. Notten, ECS Trans. 33, 213 (2010). 10.1149/1.3485258
17. T. Aaltonen, M. Alnes, O. Nilsen, L. Costelle, and H. Fjellvg, J. Mater. Chem. 20, 2877 (2010). 10.1039/b923490j
18. M. Putkonen, T. Aaltonen, M. Alnes, T. Sajavaara, O. Nilsen, and H. Fjellvg, J. Mater. Chem. 19, 8767 (2009). 10.1039/b913466b
19. A. S. Cavanagh, Y. Lee, B. Yoon, and S. M. George, ECS Trans. 22, 223 (2010). 10.1149/1.3485259
20. J. Hämäläinen, J. Holopainen, F. Munnik, T. Hatanpää, M. Heikkilä, M. Ritala, and M. Leskelä, Lithium phosphate thin films grown by atomic layer deposition., J. Electrochem. Soc. (submitted).
21. K. B. Gandrud, A. Pettersen, O. Nilsen, and H. Fjellvg, Baltic ALD 2010 GerALD 2, Hamburg, Germany, 16-17 September 2010 (unpublished).
22. T. Aaltonen, O. Nilsen, and H. Fjellvg, Baltic ALD 2010 GerALD 2, Hamburg, Germany, 16-17 September 2010 (unpublished).
23. E. H. Amonoo-Neizer, R. A. Shaw, D. O. Skovlin, and B. C. Smith, Inorg. Synth. 8, 19 (1976). 10.1002/9780470132395
24. M. Ylilammi and T. Ranta-aho, Thin Solid Films 232, 56 (1993). 10.1016/0040-6090(93)90762-E
25. N. P. Barradas, C. Jeynes, and R. P. Webb, Appl. Phys. Lett. 71, 291 (1997). 10.1063/1.119524
26. D. Von Mootz, A. Zinnius, and B. Böttcher, Angew. Chem. 81, 398 (1969). 10.1002/ange.v81:10
27. R. D. Rogers, J. L. Atwood, and R. Grüning, J. Organomet. Chem. 157, 229 (1978). 10.1016/S0022-328X(00)92291-5
28. T. Fjeldberg, M. F. Lappert, and A. J. Thorne, J. Mol. Struct. 125, 265 (1984). 10.1016/0022-2860(84)85025-5
29. H. C. M. Knoops, L. Baggetto, E. Langereis, M. C. M. van de Sanden, J. H. Klootwijk, F. Roozeboom, R. A. H. Niessen, P. H. L. Notten, and W. M. M. Kessels, J. Electrochem. Soc. 155, G287 (2008). 10.1149/1.2988651