Electrical property measurements of Cr-N codoped TiO2 epitaxial thin films grown by pulsed laser deposition

Applied Physics Letters

Volumn 102, Issue 17, 2013, Pages

  Jacimovic J ^a   Gaal R ^a   Magrez, A ^a   Forro L ^a   Regmi, M ^b   Eres, Gyula ^b  

^a EPFL   (Switzerland)

^b OAK RIDGE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLINE QUALITY; DOPING METHODS; ELECTRICAL PROPERTY MEASUREMENT; EPITAXIAL ANATASE THIN FILMS; EPITAXIAL THIN FILMS; SINGLE ELEMENT; STRUCTURAL DEFECT; TEMPERATURE-DEPENDENT RESISTIVITY;

EPITAXIAL GROWTH; PULSED LASER DEPOSITION; SEMICONDUCTOR DOPING; THIN FILMS; TITANIUM DIOXIDE;

ELECTRIC PROPERTIES;

EID: 84877264319     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4804240     Document Type: Article

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