Variable range hopping in TiO2 insulating layers for oxide electronic devices

AIP Advances

Volumn 2, Issue 1, 2012, Pages

  Zhao, Y L ^a   Lv, W M ^a   Liu, Z Q ^a   Zeng, S W ^a   Motapothula, M ^a   Dhar, S ^a   Ariando, ^a   Wang, Q ^a   Venkatesan, T ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

OXIDE FILMS; QUANTUM INTERFERENCE DEVICES; TEMPERATURE; TITANIUM DIOXIDE;

ANOMALOUS RESISTIVITY; DEPOSITION TEMPERATURES; HALL MEASUREMENTS; INSULATING LAYERS; LOW TEMPERATURES; OXIDE ELECTRONICS; QUANTUM INTERFERENCE EFFECTS; VARIABLE-RANGE HOPPING;

OXIDE MINERALS;

EID: 84865153886     PISSN: None     EISSN: 21583226     Source Type: Journal    
DOI: 10.1063/1.3682346     Document Type: Article

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