-
1
-
-
0033525158
-
Low-voltage organic transistors on plastic comprising high-dielectric constant gate insulators
-
Dimitrakopoulos C.D., Purushothaman S., Kymissis J., Callegair A., and Shaw J.M. Low-voltage organic transistors on plastic comprising high-dielectric constant gate insulators. Science 283 (1999) 822
-
(1999)
Science
, vol.283
, pp. 822
-
-
Dimitrakopoulos, C.D.1
Purushothaman, S.2
Kymissis, J.3
Callegair, A.4
Shaw, J.M.5
-
2
-
-
18744383136
-
High-mobility polymer gate dielectric pentacene thin film transistors
-
Klauk H., Halik M., Zschieschang U., Schmid G., Radlik W., and Weber W. High-mobility polymer gate dielectric pentacene thin film transistors. J Appl Phys 92 (2002) 5259
-
(2002)
J Appl Phys
, vol.92
, pp. 5259
-
-
Klauk, H.1
Halik, M.2
Zschieschang, U.3
Schmid, G.4
Radlik, W.5
Weber, W.6
-
3
-
-
18744383136
-
High-mobility polymer gate dielectric pentacene thin film transistors
-
Klauk H., Halik M., Zschieschang U., Schmid G.n., Radlik W., and Weber W. High-mobility polymer gate dielectric pentacene thin film transistors. J Appl Phys 92 (2002) 5259
-
(2002)
J Appl Phys
, vol.92
, pp. 5259
-
-
Klauk, H.1
Halik, M.2
Zschieschang, U.3
Schmid, G.n.4
Radlik, W.5
Weber, W.6
-
4
-
-
0031382876
-
Stacked pentacene layer organic thin-film transistors with improved characteristics
-
Lin Y.Y., Gundlach D.J., Nelson S.F., and Jackson T.N. Stacked pentacene layer organic thin-film transistors with improved characteristics. IEEE Electr Dev Lett 18 (1997) 606
-
(1997)
IEEE Electr Dev Lett
, vol.18
, pp. 606
-
-
Lin, Y.Y.1
Gundlach, D.J.2
Nelson, S.F.3
Jackson, T.N.4
-
5
-
-
0033314079
-
High-mobility, low voltage organic thin film transistors
-
Gundlach D.J., Klauk H., Sheraw C.D., Kuo C.-C., Huang J.-R., and Jackson T.N. High-mobility, low voltage organic thin film transistors. IEDM (1999) 111
-
(1999)
IEDM
, pp. 111
-
-
Gundlach, D.J.1
Klauk, H.2
Sheraw, C.D.3
Kuo, C.-C.4
Huang, J.-R.5
Jackson, T.N.6
-
6
-
-
13444302522
-
An organic thin-film transistor of high mobility by dielectric surface modification with organic molecule
-
Kim J.-M., Lee J.-W., Kim J.-K., Jub B.-K., Kim J.-S., Lee Y.-H., et al. An organic thin-film transistor of high mobility by dielectric surface modification with organic molecule. Appl Phys Lett 85 (2004) 6368
-
(2004)
Appl Phys Lett
, vol.85
, pp. 6368
-
-
Kim, J.-M.1
Lee, J.-W.2
Kim, J.-K.3
Jub, B.-K.4
Kim, J.-S.5
Lee, Y.-H.6
-
7
-
-
0037561648
-
High-performance OTFTs using surface-modified alumina dielectrics
-
Kelley T.W., Boardman L.D., Dunbar T.D., Muyres D.V., Pellerite M.J., and Smith T.P. High-performance OTFTs using surface-modified alumina dielectrics. J Phys Chem B 107 (2003) 5877
-
(2003)
J Phys Chem B
, vol.107
, pp. 5877
-
-
Kelley, T.W.1
Boardman, L.D.2
Dunbar, T.D.3
Muyres, D.V.4
Pellerite, M.J.5
Smith, T.P.6
-
8
-
-
0020114560
-
Advantages of thermal nitride and nitroxide gate films in VLSI process
-
Ito T., Nakamura T., and Ishikawa H. Advantages of thermal nitride and nitroxide gate films in VLSI process. IEEE Trans Electr Dev ED-29 (1982) 498
-
(1982)
IEEE Trans Electr Dev
, vol.ED-29
, pp. 498
-
-
Ito, T.1
Nakamura, T.2
Ishikawa, H.3
-
9
-
-
0021375812
-
Capture and tunnel emission of electrons by deep levels in ultrathin nitrided oxides on silicon
-
Chang S.-T., Johnson N.M., and Lyon S.A. Capture and tunnel emission of electrons by deep levels in ultrathin nitrided oxides on silicon. Appl Phys Lett 44 (1984) 316
-
(1984)
Appl Phys Lett
, vol.44
, pp. 316
-
-
Chang, S.-T.1
Johnson, N.M.2
Lyon, S.A.3
-
10
-
-
0034155417
-
Reduction of sidewall defect induced leakage currents by the use of nitrided field oxides in silicon selective epitaxial growth isolation for advanced ultralarge scale integration
-
Bashir R., Su T., Sherman J.M., Neudeck G.W., Denton J., and Obeidat A. Reduction of sidewall defect induced leakage currents by the use of nitrided field oxides in silicon selective epitaxial growth isolation for advanced ultralarge scale integration. J Vac Sci Technol B 18 (2000) 695
-
(2000)
J Vac Sci Technol B
, vol.18
, pp. 695
-
-
Bashir, R.1
Su, T.2
Sherman, J.M.3
Neudeck, G.W.4
Denton, J.5
Obeidat, A.6
-
11
-
-
0032680398
-
Scaling the gate dielectric: materials, integration, and reliability
-
Buchanan D.A. Scaling the gate dielectric: materials, integration, and reliability. IBM J Res Develop 43 (1999) 245
-
(1999)
IBM J Res Develop
, vol.43
, pp. 245
-
-
Buchanan, D.A.1
-
12
-
-
0030735702
-
3 plasma passivation on N-channel polycrystalline silicon thin-film transistors
-
3 plasma passivation on N-channel polycrystalline silicon thin-film transistors. IEEE Electr Dev 44 (1997) 64
-
(1997)
IEEE Electr Dev
, vol.44
, pp. 64
-
-
Cheng, H.-C.1
Wang, F.-S.2
Huang, C.-Y.3
-
13
-
-
36549101295
-
Secondary grain growth in thin films of semiconductors: theoretical aspects
-
Thompson C.V. Secondary grain growth in thin films of semiconductors: theoretical aspects. J Appl Phys 58 (1985) 763
-
(1985)
J Appl Phys
, vol.58
, pp. 763
-
-
Thompson, C.V.1
-
16
-
-
0035025694
-
Organic thin-film transistors: a review of recent advances
-
Dimitrakopoulos C.D., and Mascaro D.J. Organic thin-film transistors: a review of recent advances. IBM J Res Dev 45 (2001) 11
-
(2001)
IBM J Res Dev
, vol.45
, pp. 11
-
-
Dimitrakopoulos, C.D.1
Mascaro, D.J.2
|