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Volumn 22, Issue 2, 2013, Pages

Development of a large-area planar surface-wave plasma source with a cavity launcher driven by a 915 MHz UHF wave

Author keywords

[No Author keywords available]

Indexed keywords

CYLINDRICAL CAVITIES; LARGE-AREA PLASMA; PLASMA PRODUCTION EFFICIENCY; RADIAL UNIFORMITIES; SURFACE WAVE PLASMA; THICK DIELECTRICS; ULTRA-HIGH FREQUENCY; VACUUM WINDOWS;

EID: 84876260530     PISSN: 09630252     EISSN: 13616595     Source Type: Journal    
DOI: 10.1088/0963-0252/22/2/025002     Document Type: Article
Times cited : (3)

References (26)
  • 25
  • 26
    • 78149454323 scopus 로고    scopus 로고
    • 10.1002/ppap.201000080 1612-8850
    • Denis L et al 2010 Plasma Process. Polym. 7 876
    • (2010) Plasma Process. Polym. , vol.7 , Issue.9-10 , pp. 876
    • Denis, L.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.