An experimental charge density study of two isomers of hexasilabenzene

Angewandte Chemie - International Edition

Volumn 52, Issue 16, 2013, Pages 4478-4482

  Kratzert, Daniel ^a   Leusser, Dirk ^a   Holstein, Julian J ^a   Dittrich, Birger ^a   Abersfelder, Kai ^b   Scheschkewitz, David ^b   Stalke, Dietmar ^a  

^a UNIVERSITY OF GÖTTINGEN   (Germany)

^b SAARLAND UNIVERSITY   (Germany)

Author keywords

bent bonds; charge density; cluster compounds; QTAIM calculations; silicon

Indexed keywords

BENT BONDS; CHARGE CONCENTRATION; CHARGE-DENSITY DISTRIBUTION; CLUSTER COMPOUNDS; DELOCALIZATIONS; EXPERIMENTAL CHARGE DENSITY; INTERSTITIAL SI; TOPOLOGICAL ANALYSIS;

CHARGE DENSITY; SILICON; TOPOLOGY;

ISOMERS;

ORGANOSILICON DERIVATIVE;

ARTICLE; CHEMICAL STRUCTURE; CHEMISTRY; STEREOISOMERISM; SYNTHESIS; X RAY CRYSTALLOGRAPHY;

CRYSTALLOGRAPHY, X-RAY; MODELS, MOLECULAR; MOLECULAR STRUCTURE; ORGANOSILICON COMPOUNDS; STEREOISOMERISM;

EID: 84876230226     PISSN: 14337851     EISSN: 15213773     Source Type: Journal    
DOI: 10.1002/anie.201209906     Document Type: Article

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