Sputtered-anodized Ta2O5 as the dielectric layer for electrowetting-on-dielectric

Journal of Microelectromechanical Systems

Volumn 22, Issue 2, 2013, Pages 253-255

  Huang, Lian Xin ^a   Koo, Bonhye ^a   Kim, Chang Jin ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Dielectric; electrowetting; electrowetting on dielectric (EWOD); tantalum pentoxide

Indexed keywords

AIR ENVIRONMENT; CONDUCTIVE LIQUIDS; DIELECTRIC LAYER; ELECTRO WETTING; ELECTROWETTING ON DIELECTRICS; LOW-VOLTAGE; TANTALUM PENTOXIDE; WORKING LIQUID;

DIELECTRIC MATERIALS; TANTALUM OXIDES; WETTING;

DIELECTRIC DEVICES;

EID: 84875806057     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/JMEMS.2012.2233719     Document Type: Article

References (16)

1. H. Liu, S. Dharmatilleke, D. K. Maurya, and A. A. O. Tay, "Dielectric materials for electrowetting-on-dielectric actuation," Microsyst. Technol., vol. 16, no. 3, pp. 449-460, Mar. 2010.
2. Y.-Y. Lin, R. D. Evans, E. Welch, B.-N. Hsu, A. C. Madison, and R. B. Fair, "Low voltage electrowetting-on-dielectric platform using multi-layer insulators," Sens. Actuators B, Chem., vol. 150, no. 1, pp. 465-470, Sep. 2010.
3. M. Dhindsa, J. Heikenfeld, W. Weekamp, and S. Kuiper, "Electrowetting without electrolysis on self-healing dielectrics," Langmuir, vol. 27, no. 9, pp. 5665-5670, May 2011.
4. B. Raj, M. Dhindsa, N. R. Smith, R. Laughlin, and J. Heikenfeld, "Ion and liquid dependent dielectric failure in electrowetting systems," Langmuir, vol. 25, no. 20, pp. 12 387-12 392, Oct. 2009.
5. M. Dhindsa, S. Kuiper, and J. Heikenfeld, "Reliable and low-voltage electrowetting on thin parylene films," Thin Solid Films, vol. 519, no. 10, pp. 3346-3351, Mar. 2011.
6. H. Moon, S. K. Cho, R. L. Garrell, and C.-J. Kim, "Low voltage electrowetting-on-dielectric," J. App. Phys., vol. 92, no. 7, pp. 4080-4087, Oct. 2002.
7. D. Muth, "Ellipsometer study of anodic oxides formed on sputtered tantalum and tantalum-aluminum alloy films," J. Vac. Sci. Technol., vol. 6, no. 4, pp. 749-752, Jul. 1969.
8. O. Kerrec, D. Devilliers, H. Groult, andM. Chemla, "Dielectric- properties of anodic oxide-films on tantalum," Electrochim. Acta, vol. 40, no. 6, pp. 719-724, Apr. 1995.
9. Y. Li, W. Parkes, L. I. Haworth, A. W. S. Ross, J. T. M. Stevenson, and A. J. Walton, "Room-temperature fabrication of anodic tantalum pentoxide for low-voltage electrowetting on dielectric (EWOD)," J. Microelectromech. Syst., vol. 17, no. 6, pp. 1481-1488, Dec. 2008.
10. L.-X. Huang, B. Koo, and C.-J. Kim, "Evaluation of anodic Ta2O5 as the dielectric layer for EWOD devices," in Proc. IEEE Int. Conf. MEMS, Paris, France, Jan. 2012, pp. 428-431.
11. S. G. Byeon and Y. Tzeng, "Charge trapping/generation and reliability for high performance tantalum oxide capacitors," J. Appl. Phys., vol. 66, no. 10, pp. 4837-4842, Nov. 1989.
12. L. Young, "Anodization constants for tantalum," J. Electron. Soc., vol. 124, no. 4, pp. 528-529, Apr. 1977.
13. L. Young, Anodic Oxides Films. New York: Academic, 1961.
14. S. G. Byeon and Y. Tzeng, "Improved oxide properties by anodization of aluminum films with thin sputtered aluminum oxide overlays," J. Electrochem. Soc., vol. 135, no. 10, pp. 2452-2458, Oct. 1988.
15. S. Sood, R. Peelamedu, K. B. Sundaram, E. Dein, and R. M. Todi, "Wet etching of sputtered tantalum thin films in NaOH and KOH based solutions," J. Mater. Sci., Mater. Electron., vol. 18, no. 5, pp. 535-539, May 2007. (Pubitemid 46336206)
16. A. G. Gad Allah, W. A. Badawy, and H. H. Rehan, "Stability of anodic tantalum oxide films in NaOH solutions," J. Appl. Electrochem., vol. 19, no. 5, pp. 768-776, Sep. 1989.