Wet etching of sputtered tantalum thin films in NaOH and KOH based solutions

Journal of Materials Science: Materials in Electronics

Volumn 18, Issue 5, 2007, Pages 535-539

  Sood, S ^a   Peelamedu, R ^a   Sundaram, K B ^a   Dein, E ^a   Todi, R M ^a  

^a UNIVERSITY OF CENTRAL FLORIDA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

SPUTTERED TANTALUM THIN FILMS;

DEPOSITION; MAGNETRON SPUTTERING; POTASSIUM HYDROXIDE; SODIUM COMPOUNDS; TANTALUM; WET ETCHING; YTTRIA STABILIZED ZIRCONIA;

THIN FILMS;

EID: 33847408367     PISSN: 09574522     EISSN: 1573482X     Source Type: Journal    
DOI: 10.1007/s10854-006-9053-z     Document Type: Article

References (7)

1. W.D. Westwood, et al., Tantalum Thin Films (Academic Press, London, 1975).
2. P. N. Baker, Invited Review. Thin Solid Films 14, 3-25 (1972)
3. D. Ernur, et al., Microelectron. Eng. 64, 117-124 (2002).
4. S. Kondo, et al., Jpn. J. Appl. Phys. 39 (Pt 1, No.11), 6216 (2000).
5. R. Hsiao, et al., Thin Solid Films 304 (1-2), 381 (1997).
6. B. Wu, et al., United States Patent 6,329,299 (2001).
7. H. Endo, et al., United States Patent. 4,446,115 (1984).