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Materials Science in Semiconductor Processing

Volumn 16, Issue 2, 2013, Pages 513-519

Preparation and characterization of TiO2 thin film by thermal oxidation of sputtered Ti film

(5) Zhou, Bing a,b Jiang, Xiaohong a Liu, Zhubo b Shen, Ruiqi a Rogachev, Aleksandr V b

a NANJING UNIVERSITY OF SCIENCE AND TECHNOLOGY (China)

b FRANCISK SKORINA GOMEL STATE UNIVERSITY (Belarus)

Author keywords

Photocatalytic activity; Sputtered Ti film; Thermal oxidation; TiO 2; Transmittance

Indexed keywords

PHOTOCATALYTIC ACTIVITIES; THERMAL OXIDATION; TI FILM; TIO; TRANSMITTANCE;

ATOMIC FORCE MICROSCOPY; CRYSTAL STRUCTURE; MORPHOLOGY; OPTICAL PROPERTIES; OXIDATION; PHOTOCATALYSIS; PHOTODEGRADATION; PHOTOELECTRONS; QUARTZ; RAMAN SPECTROSCOPY; THIN FILMS; TITANIUM; TITANIUM DIOXIDE; ULTRAVIOLET VISIBLE SPECTROSCOPY; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

FILM PREPARATION;

EID: 84875224377 PISSN: 13698001 EISSN: None Source Type: Journal
DOI: 10.1016/j.mssp.2012.05.001 Document Type: Article

Times cited : (58)

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