The effect of sputtering gas pressure on structure and photocatalytic properties of nanostructured titanium oxide self-cleaning thin film

Vacuum

Volumn 85, Issue 3, 2010, Pages 400-405

  Nejand, B Abdollahi ^a   Sanjabi, S ^a   Ahmadi, V ^a  

^a TARBIAT MODARES UNIVERSITY   (Iran)

Author keywords

Nanostructured TiO2 thin films; Photocatalytic activity; Sputtering; Structure

Indexed keywords

AIR ATMOSPHERE; ANATASE PHASE; DC REACTIVE MAGNETRON SPUTTERING; DEPOSITED FILMS; DEPOSITED LAYER; GAS PRESSURES; GRAIN SIZE; METHYLENE BLUE; NANOSTRUCTURED TIO2 THIN FILMS; NANOSTRUCTURED TITANIUM; OPTICAL TRANSMITTANCE; PHOTOCATALYTIC ACTIVITIES; PHOTOCATALYTIC PROPERTY; POST ANNEALING; SEM; SODA LIME GLASS; SPUTTERING GAS PRESSURE; STRUCTURE; STRUCTURE AND MORPHOLOGY; TIO; TITANIUM OXIDE THIN FILMS; VISIBLE LIGHT; ZNO; ZNO THIN FILM;

AIR CLEANERS; ANNEALING; ATOMIC FORCE MICROSCOPY; ORGANIC POLYMERS; PRESSURE EFFECTS; SCANNING ELECTRON MICROSCOPY; SILICON COMPOUNDS; THIN FILMS; TITANIUM; TITANIUM DIOXIDE; TITANIUM OXIDES; VAPOR DEPOSITION; X RAY DIFFRACTION; ZINC OXIDE;

OXIDE FILMS;

EID: 77957775813     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2010.08.001     Document Type: Article

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