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Volumn , Issue 1, 2002, Pages 116-119
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Growth and characteristics of In-doped GaN thin films
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Author keywords
[No Author keywords available]
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Indexed keywords
ATOMIC FORCE MICROSCOPY;
DEEP LEVEL TRANSIENT SPECTROSCOPY;
FLOW RATE;
GALLIUM NITRIDE;
HALL MOBILITY;
III-V SEMICONDUCTORS;
METALLORGANIC CHEMICAL VAPOR DEPOSITION;
NITRIDES;
SAPPHIRE;
SEMICONDUCTOR DOPING;
SINGLE CRYSTALS;
THIN FILMS;
WIDE BAND GAP SEMICONDUCTORS;
DISLOCATION DENSITIES;
ELECTRICAL CHARACTERISTIC;
HALL EFFECT MEASUREMENT;
INTERFACE LAYER;
MIXED-CONDUCTION MODEL;
TEMPERATURE DEPENDENT;
TRIMETHYLINDIUM;
X RAY ROCKING CURVE;
INDIUM COMPOUNDS;
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EID: 84875091738
PISSN: 16101634
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1002/pssc.200390003 Document Type: Conference Paper |
Times cited : (2)
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References (9)
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